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Understanding the trade-offs in multi-level cell ReRAM memory design

Published:29 May 2013Publication History

ABSTRACT

Resistive Random Access Memory (ReRAM) is one of the most promising emerging memory technologies as a potential replacement for DRAM memory and/or NAND Flash. Multi-level cell (MLC) ReRAM, which can store multiple bits in a single ReRAM cell, can further improve density and reduce cost-per-bit, and therefore has recently been investigated extensively. However, the majority of the prior studies on MLC ReRAM are at the device level. The design implications for MLC ReRAM at the circuit and system levels remain to be explored. This paper aim to provide the first comprehensive investigation of the design trade-offs involved in MLC ReRAM. Our study indicates that different resistance allocation schemes, programming strategies, peripheral designs, and material selections profoundly affect the area, latency, power, and reliability of MLC ReRAM. Based on this analysis, we conduct two case studies: first we compare MLC ReRAM design against MLC phase-change memory (PCM) and multi-layer cross-point ReRAM design, and point out why multi-level ReRAM is appealing; second we further explore the design space for MLC ReRAM.

References

  1. W.-C. Chien et al. Multi-level 40nm WOx resistive memory with excellent reliability. In Proceedings of the International Electron Devices Meeting, Dec. 2011.Google ScholarGoogle Scholar
  2. X. Dong et al. NVSim: A circuit-level performance, energy, and area model for emerging nonvolatile memory. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 31(7):994--1007, 2012.Google ScholarGoogle ScholarDigital LibraryDigital Library
  3. B. Gao et al. Modeling of retention failure behavior in bipolar oxide-based resistive switching memory. Electron Device Letters, 32(3):276--278, 2011.Google ScholarGoogle ScholarCross RefCross Ref
  4. X. Guan et al. A spice compact model of metal oxide resistive switching memory with variations. Electron Device Letters, 33(10):1405--1407, 2012.Google ScholarGoogle ScholarCross RefCross Ref
  5. IC Knowledge LLC. IC cost model revision 1105.Google ScholarGoogle Scholar
  6. A. Kawahara et al. An 8Mb multi-layered cross-point ReRAM macro with 443MB/s write throughput. In Proceedings of International Solid-State Circuits Conference, Feb. 2012.Google ScholarGoogle Scholar
  7. B. Lee et al. Architecting phase change memory as a scalable DRAM alternative. In Proceedings of the International Symposium on Computer Architecture, 2009. Google ScholarGoogle ScholarDigital LibraryDigital Library
  8. H. Lee et al. Low-power and nanosecond switching in robust hafnium oxide resistive memory with a thin ti cap. Electron Device Letters, 31(1):44--46, 2010.Google ScholarGoogle ScholarCross RefCross Ref
  9. S. R. Lee et al. Multi-level switching of triple-layered TaOx RRAM with excellent reliability for storage class memory. In Proceedings of Symposium on VLSI Technology, June 2012.Google ScholarGoogle ScholarCross RefCross Ref
  10. J. Liang et al. Scaling challenges for the cross-point resistive memory array to sub-10nm node - an interconnect perspective. In Proceedings of International Memory Workshop, May 2012.Google ScholarGoogle ScholarCross RefCross Ref
  11. M. Liu et al. Multilevel resistive switching with ionic and metallic filaments. Applied Physics Letters, 94(23):233106, 2009.Google ScholarGoogle ScholarCross RefCross Ref
  12. H. Nakatsuka. Derivation and implication of a novel DRAM bit cost model. IEEE Transactions on Semiconductor Manufacturing, 15(2):279--284, 2002.Google ScholarGoogle ScholarCross RefCross Ref
  13. G. Palumbo and D. Pappalardo. Charge pump circuits: An overview on design strategies and topologies. IEEE Circuits and Systems Magazine, 10(1):31--45, 2010. Google ScholarGoogle ScholarDigital LibraryDigital Library
  14. J. Park et al. Investigation of state stability of low-resistance state in resistive memory. Electron Device Letters, 31(5):485--487, 2010.Google ScholarGoogle ScholarCross RefCross Ref
  15. S.-S. Sheu et al. A 4Mb embedded SLC resistive-RAM macro with 7.2ns read-write random-access time and 160ns MLC-access capability. In Proceedings of the International Solid-State Circuits Conference, 2011.Google ScholarGoogle ScholarCross RefCross Ref
  16. S.-Y. Wang et al. Multilevel resistive switching in Ti/CuxO/Pt memory devices. Journal of Applied Physics, 108(11):114110, 2010.Google ScholarGoogle ScholarCross RefCross Ref
  17. H.-S. Wong et al. Metal oxide RRAM. Proceedings of the IEEE, 100(6):1951--1970, 2012.Google ScholarGoogle ScholarCross RefCross Ref
  18. C. Yoshida et al. High speed resistive switching in Pt/TiO2/TiN film for nonvolatile memory application. Applied Physics Letters, 91(22):223510, 2007.Google ScholarGoogle ScholarCross RefCross Ref
  19. S. Yu et al. A monte carlo study of the low resistance state retention of HfOx based resistive switching memory. Applied Physics Letters, 100(4):043507, 2012.Google ScholarGoogle ScholarCross RefCross Ref
  20. W. Zhao and Y. Cao. New generation of predictive technology model for sub-45nm design exploration. In Proceedings of the International Symposium on Quality Electronic Design, Mar. 2006. Google ScholarGoogle ScholarDigital LibraryDigital Library

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            cover image ACM Conferences
            DAC '13: Proceedings of the 50th Annual Design Automation Conference
            May 2013
            1285 pages
            ISBN:9781450320719
            DOI:10.1145/2463209

            Copyright © 2013 ACM

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            Publication History

            • Published: 29 May 2013

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