DAC

Pan D, Lin Y, Xu X, Ou J, Gallagher E and Buck P (2017). Machine learning for mask/wafer hotspot detection and mask synthesis Photomask Technology, 10.1117/12.2282943, 9781510613768, (10)

Capodieci L, Cain J, Liu H, Han T, Zhou J and Chen Y (2016). Layout decomposition and synthesis for a modular technology to solve the edge-placement challenges by combining selective etching, direct stitching, and alternating-material self-aligned multiple patterning processes SPIE Advanced Lithography, 10.1117/12.2219082, , (97810P), Online publication date: 16-Mar-2016.

Sturtevant J, Capodieci L, Badr Y, Ma K and Gupta P (2014). Layout pattern-driven design rule evaluation SPIE Advanced Lithography, 10.1117/12.2046140, , (905307), Online publication date: 28-Mar-2014.

Sturtevant J, Capodieci L, Ban Y, Choi C, Shin H, Kang Y and Paik W (2014). Analysis and optimization of process-induced electromigration on signal interconnects in 16nm FinFET SoC (system-on-chip) SPIE Advanced Lithography, 10.1117/12.2046207, , (90530P), Online publication date: 28-Mar-2014.