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Erschienen in: Journal of Electronic Materials 6/2023

25.03.2023 | Original Research Article

Elevated Transition Temperature of VO2 Thin Films via Cr Doping: A Combined Electrical Transport and Electronic Structure Study

verfasst von: M. Zzaman, R. Dawn, J. B. Franklin, A. Kumari, A. Ghosh, S. K. Sahoo, V. K. Verma, R. Shahid, U. K. Goutam, K. Kumar, R. Meena, A. Kandasami, V. R. Singh

Erschienen in: Journal of Electronic Materials | Ausgabe 6/2023

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Abstract

V1−xCrxO2 (0 ≤ x ≤ 0.3) (VCO) thin films were deposited onto r-sapphire substrates using a pulsed laser deposition method. The electronic structures of these compounds were investigated by x-ray photoemission spectroscopy (XPS), and the electrical transport measurements by four-probe electrical resistivity along with the Hall effect measurements. The XPS study shows that the valency of the Cr ions in the VCO films is 3 + and the V ions are in mixed states of 4 + and 5 + . From the resistivity-temperature measurements, the metal–insulator transition (MIT) temperature (TC) of Vanadium dioxide (VO2) increases significantly upon Cr doping, while the hysteresis width and resistivity follow a gradual decrease. These findings will pave the way for the usage of VO2 films in solar and electrical device applications where larger critical temperatures than pristine VO2 are required.

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Metadaten
Titel
Elevated Transition Temperature of VO2 Thin Films via Cr Doping: A Combined Electrical Transport and Electronic Structure Study
verfasst von
M. Zzaman
R. Dawn
J. B. Franklin
A. Kumari
A. Ghosh
S. K. Sahoo
V. K. Verma
R. Shahid
U. K. Goutam
K. Kumar
R. Meena
A. Kandasami
V. R. Singh
Publikationsdatum
25.03.2023
Verlag
Springer US
Erschienen in
Journal of Electronic Materials / Ausgabe 6/2023
Print ISSN: 0361-5235
Elektronische ISSN: 1543-186X
DOI
https://doi.org/10.1007/s11664-023-10359-0

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