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Open Access 01-06-2009 | ORIGINAL ARTICLE

An IC yield enhancement approach by ARMA modeling and dynamic process control

Authors: Liren Yan, Wei Huang

Title: An IC yield enhancement approach by ARMA modeling and dynamic process control
Authors: Liren Yan
Wei Huang
Publication date: 01-06-2009
Publisher: Springer-Verlag
Published in: The International Journal of Advanced Manufacturing Technology / Issue 7-8/2009
Print ISSN: 0268-3768
Electronic ISSN: 1433-3015
DOI: https://doi.org/10.1007/s00170-008-1631-1

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