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Technical Physics
Published in: Technical Physics 5/2019

01-05-2019 | PHYSICAL ELECTRONICS

Electronic and Optical Properties of NiSi2/Si Nanofilms

Authors: B. E. Umirzakov, D. A. Tashmukhamedova, A. K. Tashatov, N. M. Mustafoeva

Published in: Technical Physics | Issue 5/2019

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Abstract

Optimum conditions for ion implantation and subsequent annealing for the fabrication of NiSi2/Si (111) nanofilms with a thickness of 3.0–6.0 nm are determined. It is demonstrated that the energy-band parameters and optical properties typical of thick NiSi2 films start to set in at d = 5.0–6.0 nm.
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Metadata
Title
Electronic and Optical Properties of NiSi2/Si Nanofilms
Authors
B. E. Umirzakov
D. A. Tashmukhamedova
A. K. Tashatov
N. M. Mustafoeva
Publication date
01-05-2019
Publisher
Pleiades Publishing
Published in
Technical Physics / Issue 5/2019
Print ISSN: 1063-7842
Electronic ISSN: 1090-6525
DOI
https://doi.org/10.1134/S1063784219050244

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