2019 | OriginalPaper | Chapter
Influence of Deposition Parameters on the Structure of TiO2 Thin Films Prepared by Reactive Magnetron Sputtering Technique
Authors : Vytautas Kavaliunas, Audrone Sestakauskaite, Mantas Sriubas, Giedrius Laukaitis
Published in: Recent Advances in Technology Research and Education
Publisher: Springer International Publishing
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