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2010 | OriginalPaper | Chapter

15. Photoresists

Authors : Fumitaka Saimura, Michael Santorelli

Published in: Phenolic Resins: A Century of Progress

Publisher: Springer Berlin Heidelberg

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Abstract

Lithographic technology by photoresist is an important technique for today’s electronic industries. In the manufacture of a semiconductor and a liquid crystal display (LCD), a photoresist is used as the key photo sensitive material. Phenolic resin is the base polymer that controls photoresist characteristics and plays an active role in these vital electronic industries.
In this chapter, we discuss phenolic resins for photoresists, meta–para cresol novolaks, important properties for photoresist such as meta–para ratio, molecular weight, and alkali dissolution rate. Moreover, various types of phenolic resins for photoresists and production technology are also discussed.

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Metadata
Title
Photoresists
Authors
Fumitaka Saimura
Michael Santorelli
Copyright Year
2010
Publisher
Springer Berlin Heidelberg
Book
Phenolic Resins: A Century of Progress

Print ISBN: 978-3-642-04713-8

Electronic ISBN: 978-3-642-04714-5

Copyright Year: 2010

DOI
https://doi.org/10.1007/978-3-642-04714-5_15

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