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Chinese Journal of Mechanical Engineering
Published in: Chinese Journal of Mechanical Engineering 2/2017

01-03-2017 | Original Article

Prediction of the Interface Temperature Rise in Tribochemical Polishing of CVD Diamond

Authors: Zewei YUAN, Yan HE, Zhuji JIN, Peng ZHENG, Qiang LI

Published in: Chinese Journal of Mechanical Engineering | Issue 2/2017

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Abstract

Tribochemcial polishing is one of the most efficient methods for polishing CVD (Chemical Vapor Deposition) diamond film due to the use of catalytic metal. However the difficulty to control the interface temperature during polishing process often results in low material removal because of the unstable contact process. So this research investigates the contact process in the tribochemical polishing of CVD diamond film and proposes a dynamic contact model for predicting the actual contact area, the actual contact pressure, and the interface temperature in the polishing process. This model has been verified by characterizing surface metrology of the CVD diamond with Talysurf CLI2000 3D Surface Topography and measuring the polishing temperature. The theoretical and experimental results shows that the height distribution of asperities on diamond film surface in the polishing process is well evaluated by combining the height distribution of original and polished asperities. The modeled surface asperity height distribution of diamond film agrees with the actual surface metrology in polishing process. The actual contact pressure is very large due to the small actual contact area. The predicted interface temperature can reach the catalytic reaction temperature between diamond and polishing plate when the lowest rotation speed and load are 10 000 r/min and 50 N, respectively, and diamond material is significantly removed. The model may provide effective process theory for tribochemcial polishing.
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Literature
1.
KUBOTA A, NAGAE S, TOUGE M. Improvement of material removal rate of single-crystal diamond by polishing using H2O2 solution[J]. Diamond & Related Materials, 2016, 70: 39–45.
2.
YANG Ning, ZONG Wenjun, LI Zengqiang, et al. Wear process of single crystal diamond affected by sliding velocity and contact pressure in mechanical polishing[J]. Diamond & Related Materials, 2015, 58:46–53.
3.
ZONG Wenjun, ZHANG Junjie, LIU Yue, et al. Achieving ultra-hard surface of mechanically polished diamond crystal by thermo- chemical refinement[J]. Applied Surface Science, 2014, 316: 617– 624.
4.
SCHWANDER M, PARTES K. A review of diamond synthesis by CVD processes[J]. Diamond and Related Materials, 2011, 20(9): 1287–1301.
5.
MAY P W. Diamond thin films: a 21st-century material[J]. Philosophcal Transactions of the Royal Society, 2000, A358 (1766): 473–495.
6.
SCHUELKE T, GROTJOHN T A. Diamond polishing[J]. Diamond & Related Materials, 2013, 32: 17–25.
7.
MALSHE A P, PARK B S, BROWN W D, et al. A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates[J]. Diamond and Related Material, 1999, 8(7): 1198–1213.
8.
CHEN Kai, ZHANG Li. CVD diamond film polishing method based on accelerant theory and uniformity analysis[J]. Sensor & Transducers, 2014, 173(6): 305–310.
9.
HHUANG S T, ZHOU L, XU L F, et al. A super-high speed polishing technique for CVD diamond films[J]. Diamond & Related Materials, 2010, 19: 1316–1323.
10.
KUBOTA A, NAGAE S, MOTOYAMA S, et al. Two-step polishing technique for single crystal diamond(100) substrate utilizing a chemical reaction with iron plate[J]. Diamond & Related Materials, 2015, 60: 75–80.
11.
THOMAS E L H, NELSON G W, MANDAL S, et al. Chemical mechanical polishing of thin film diamond[J]. Carbon, 2014, 68: 473–479.
12.
KUBOTA A. FUKUYAMA S, ICHIMORI Y, et al. Surface smoothing of single-crystal diamond(100) substrate by polishing technique[J]. Diamond & Related Materials, 2012, 24: 59–62.
13.
WATANABE J, TOUGE M, SAKAMOTO T. Ultraviolet-irradiated precision polishing of diamond and its related materials[J]. Diamond & Related Materials, 2013, 39:14–19.
14.
WANG C Y, ZHANG F L, KUANG T C, et al. Chemical/ mechanical polishing of diamond films assisted by molten mixture of LiNO3 and KNO3[J]. Thin Solid Films, 2006, 496(2): 698–702.
15.
YUAN Zewei, JIN Zhuji, ZHANG Youjun, et al. Chemical mechanical polishing slurries for chemically vapor-deposited diamond films[J]. Journal of Manufacturing Science and Engineering of the ASME, 2013, 135: 041006.
16.
CHEN Y, ZHANG L C, ARSECULARATNE J A. Polishing of polycrystalline diamond by the technique of dynamic friction. Part 2: Material removal mechanism[J]. International Journal of Machine Tools & Manufacture, 2007, 47(15): 1615–1624.
17.
JIN Zhuji, YUAN Zewei, KANG Renke, at al. Fabrication and characterization of FeNiCr Matrix-TiC composite for polishing CVD diamond film[J]. Journal of Materials Science & Technology, 2009, 25(3):319–324.
18.
YUAN Zewei, JIN Zhuji, KANG Renke, et al. Tribochemical polishing CVD diamond film with FeNiCr alloy polishing plate prepared by MA-HPS technique[J]. Diamond & Related Materials, 2012, 21: 50–57.
19.
CHEN Y, ZHANG L C. Polishing polycrystalline diamond by the technique of dynamic friction, part 4: Establishing the polishing map[J]. International Journal of Machine Tool & Manufacture, 2009, 49: 309–314.
20.
CHEN Y, ZHANG L C, Tang F. Surface integrity of PCD composites generated by dynamic friction polishing: Effect of processing conditions[J]. Diamond & Related Materials, 2012, 26:25–31.
21.
YU T, ASPLUND D T, BASTAWROS A F, CHANDRA A. Performance and modeling of paired polishing process[J]. International Journal of Machine Tools & Manufacture, 2016, 109: 49–57.
22.
GREENWOOD J A, WILLIAMSON J B P. Contact of nominally flat surfaces[J]. Proceedings of the Royal Society of London. Series A, Mathematical and Physical Sciences, 1966, 295: 300–319.
23.
FISCHER-CRIPPS A C. The Hertzian contact surface[J]. Journal of Materials Science, 1999, 34(1): 129–137.
24.
CHEN Y, ZHANG L C, ARSECULARATNE J A, et al. Polishing of polycrystalline diamond by the technique of dynamic friction, part 1: Prediction of the interface temperature rise[J]. International Journal of Machine Tools & Manufacture, 2006, 46(3–4): 580–587.
25.
WANG C, SHERMAN P, CHANDRA A, et al. Pad surface roughness and slurry particle size distribution effects on material removal rate in chemical mechanical planarization[J]. CIRP Annals, 2005, 54(1): 309–312.
26.
XIE Y, WILLIAMS J A. The prediction of friction and wear when a soft surface slides against a harder rough surface[J]. Wear, 1996, 196(1–2): 21–34.
27.
KENNEDY Francis E. Frictional Heating and Contact Temperatures[M]. Boca Raton: CRC Press, 2000.
28.
LEONARD J B, THOMAS W, COLIN P, et al. A theory of pad conditioning for chemical-mechanical polishing[J]. Journal of Engineering Mathematics, 2004, 50(1): 1–24.
29.
ZHU Aibin, LI Pei, ZHANG Yefan, et al. Influence of particles on the loading capacity and the temperature rise of water film in ultra-high speed hybrid bearing[J]. Chinese Journal of Mechanical Engineering, 2015, 28(3): 541–548.
Metadata
Title
Prediction of the Interface Temperature Rise in Tribochemical Polishing of CVD Diamond
Authors
Zewei YUAN
Yan HE
Zhuji JIN
Peng ZHENG
Qiang LI
Publication date
01-03-2017
Publisher
Chinese Mechanical Engineering Society
Published in
Chinese Journal of Mechanical Engineering / Issue 2/2017
Print ISSN: 1000-9345
Electronic ISSN: 2192-8258
DOI
https://doi.org/10.1007/s10033-017-0087-3

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