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Journal of Materials Science
Published in: Journal of Materials Science 23/2013

01-12-2013

Preparation of porous glass films using phase separation phenomenon and growth behavior of phase-separated structure

Authors: C. Hwang, J. Kim, Bong Ki Ryu, H. Takebe

Published in: Journal of Materials Science | Issue 23/2013

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Abstract

We report the preparation of porous glass films on transparent conductive oxide-coated glass substrates using the phase separation phenomena and the growth behavior of the phase-separated structure. We confirmed that the etched glass films are composed of microscale pores, a three-dimensional porous framework of SiO2-rich phase with widths of about 40–300 nm, and a thin surface layer of about 40–90 nm thick. The SiO2-rich phase grew by diffusion-dominated growth and then viscous flow-dominated growth.
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Appendix
Available only for authorised users
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Metadata
Title
Preparation of porous glass films using phase separation phenomenon and growth behavior of phase-separated structure
Authors
C. Hwang
J. Kim
Bong Ki Ryu
H. Takebe
Publication date
01-12-2013
Publisher
Springer US
Published in
Journal of Materials Science / Issue 23/2013
Print ISSN: 0022-2461
Electronic ISSN: 1573-4803
DOI
https://doi.org/10.1007/s10853-013-7618-9

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