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Metals and Materials International
Published in: Metals and Materials International 5/2009

01-10-2009

Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition

Authors: Suyean Kim, Byungwhan Kim

Published in: Metals and Materials International | Issue 5/2009

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Metadata
Title
Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition
Authors
Suyean Kim
Byungwhan Kim
Publication date
01-10-2009
Publisher
The Korean Institute of Metals and Materials
Published in
Metals and Materials International / Issue 5/2009
Print ISSN: 1598-9623
Electronic ISSN: 2005-4149
DOI
https://doi.org/10.1007/s12540-009-0881-7

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