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Published in: Tribology Letters 2/2007

01-11-2007 | Original Paper

The Effect of UV Stabilizer on the Photo Degradation of Perfluoropolyether Lubricants Used in Hard Disk

Authors: Jihye Lee, Sang-Wook Chun, Ho-Jong Kang, Frank E. Talke

Published in: Tribology Letters | Issue 2/2007

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Abstract

Ultraviolet (UV) light exposure can lead to photo degradation of perfluoropolyether (PFPE) lubricants, resulting in a change of their physical properties. In this article, 2,3,4,5,6–pentafluorobenzophenone was used as an ultraviolet stabilizer (UVS) to slow down the photo degradation of PFPE. PFPE/UVS mixtures were exposed to UV light and the mechanism of photo degradation was studied with nuclear magnetic resonance (NMR). Small amounts of UVS (less than 0.3 wt.%) were found to effectively stabilize both UV photo degradation at the main chain and the end chain of PFPE without affecting the thermal stability of PFPE. However, phase separation of PFPE and UVS was found to occur due to chemical incompatibility of the components.

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Literature
1.
go back to reference Ruigrok, J.J.M., Coehoorn, R., Cumpson, S.R., Kesteren, H.W.: Disk recording beyond 100Gb/in2: hybrid recording? J. Appl. Phys. 87, 5398–5403 (2000)CrossRef Ruigrok, J.J.M., Coehoorn, R., Cumpson, S.R., Kesteren, H.W.: Disk recording beyond 100Gb/in2: hybrid recording? J. Appl. Phys. 87, 5398–5403 (2000)CrossRef
2.
go back to reference Katayama, H., Hamamoto, M., Sato, J., Murakami, Y., Kojima, K.: New developments in laser-assisted magnetic recording. IEEE Trans. Magn. 36, 195–199 (2000)CrossRef Katayama, H., Hamamoto, M., Sato, J., Murakami, Y., Kojima, K.: New developments in laser-assisted magnetic recording. IEEE Trans. Magn. 36, 195–199 (2000)CrossRef
3.
go back to reference Alex, M., Tselikov A., McDaniel, T.: Characteristics of thermally assisted magnetic recording. IEEE Trans. Magn. 37, 1244–1249 (2001)CrossRef Alex, M., Tselikov A., McDaniel, T.: Characteristics of thermally assisted magnetic recording. IEEE Trans. Magn. 37, 1244–1249 (2001)CrossRef
4.
go back to reference Ruigrok, J.J.M.: Limits of conventional and thermally-assisted recording. J. Mag. Soc. Jpn. 25, 313 (2001)CrossRef Ruigrok, J.J.M.: Limits of conventional and thermally-assisted recording. J. Mag. Soc. Jpn. 25, 313 (2001)CrossRef
5.
go back to reference Kimura, J., Maenosono, S., Yamaguchi, Y.: Near-field optical recording on a CdSe nanocrystal thin film. Nanotechnology 14, 69–72 (2003)CrossRef Kimura, J., Maenosono, S., Yamaguchi, Y.: Near-field optical recording on a CdSe nanocrystal thin film. Nanotechnology 14, 69–72 (2003)CrossRef
6.
go back to reference Tominaga, J., Nakano T.: Optical Near-field Recording: Science and Technology. Springer, Berlin New York, (2005) Tominaga, J., Nakano T.: Optical Near-field Recording: Science and Technology. Springer, Berlin New York, (2005)
7.
go back to reference Yang, M., Talk, F.E., Perettie, D.J., Morgan, T.A., Kar, K.K.: Environmental effects on phosphazene lubricated computer hard disks. IEEE Trans. Magn. 30, 4143–4144 (1994)CrossRef Yang, M., Talk, F.E., Perettie, D.J., Morgan, T.A., Kar, K.K.: Environmental effects on phosphazene lubricated computer hard disks. IEEE Trans. Magn. 30, 4143–4144 (1994)CrossRef
8.
go back to reference Yang, Y., Talke, F.E., Perettie, D.J., Morgan, T.A., Kar, K.K.: Cyclotriphosphazenes as potential lubricants for thin film hard disks. STLE Trans. 38, 636–644 (1995) Yang, Y., Talke, F.E., Perettie, D.J., Morgan, T.A., Kar, K.K.: Cyclotriphosphazenes as potential lubricants for thin film hard disks. STLE Trans. 38, 636–644 (1995)
9.
go back to reference Perettie, D.J., Morgan, T.A., Kar, K.K.: X -1p as a dual purpose lubricant for pseudo-contact recording. IDEMA Insight 9, 1–3 (1996) Perettie, D.J., Morgan, T.A., Kar, K.K.: X -1p as a dual purpose lubricant for pseudo-contact recording. IDEMA Insight 9, 1–3 (1996)
10.
go back to reference Perettie, D.J., Johson, W.D., Morgan, T.A., Kar, K.K., Potter, G.E., Dekoven, B.M., Putzig, C.L., Chao, J., Gao, Y.C., Russak, M.: Cyclic phosphazene as advanced lubricants for thin film magnetic media. Adv. Info. Storage Syst. 7, 157–163 (1996) Perettie, D.J., Johson, W.D., Morgan, T.A., Kar, K.K., Potter, G.E., Dekoven, B.M., Putzig, C.L., Chao, J., Gao, Y.C., Russak, M.: Cyclic phosphazene as advanced lubricants for thin film magnetic media. Adv. Info. Storage Syst. 7, 157–163 (1996)
11.
go back to reference Saperstein, D.D., Lin, L.J.: Improved surface adhesion and coverage of perfluoropolyethers lubricants following far-UV irradiation. Langmuir 6, 1522–1524 (1990)CrossRef Saperstein, D.D., Lin, L.J.: Improved surface adhesion and coverage of perfluoropolyethers lubricants following far-UV irradiation. Langmuir 6, 1522–1524 (1990)CrossRef
12.
go back to reference Zhao, X., Bhushan, B., Kajdas, C.: Lubrication studies of head-disk interface in a controlled environment part 2: degradation mechanisms of perfluoropolyether lubricants. IMechE 214, 547–559 (2000) Zhao, X., Bhushan, B., Kajdas, C.: Lubrication studies of head-disk interface in a controlled environment part 2: degradation mechanisms of perfluoropolyether lubricants. IMechE 214, 547–559 (2000)
13.
go back to reference Zhu, L., Liew, T.: Spectral characterization of perfluoropolyethers lubricant irradiated by laser light. Appl. Surf. Sci. 203–204, 871–874 (2003)CrossRef Zhu, L., Liew, T.: Spectral characterization of perfluoropolyethers lubricant irradiated by laser light. Appl. Surf. Sci. 203–204, 871–874 (2003)CrossRef
14.
go back to reference Vurens, G.H., Mate, C.M.: The thermal stability of perfluoropolyethers on carbon surfaces. Appl. Surf. Sci. 59, 281–287 (1992)CrossRef Vurens, G.H., Mate, C.M.: The thermal stability of perfluoropolyethers on carbon surfaces. Appl. Surf. Sci. 59, 281–287 (1992)CrossRef
15.
go back to reference Scheirs, J., Camino, G., Costa, L., Tonelli, C., Scicchitano, M., Turri, S.: Photooxidation of functionalized perfluorinated polyethers–I. Polym. Degrad. Stab. 56, 239–253 (1997)CrossRef Scheirs, J., Camino, G., Costa, L., Tonelli, C., Scicchitano, M., Turri, S.: Photooxidation of functionalized perfluorinated polyethers–I. Polym. Degrad. Stab. 56, 239–253 (1997)CrossRef
Metadata
Title
The Effect of UV Stabilizer on the Photo Degradation of Perfluoropolyether Lubricants Used in Hard Disk
Authors
Jihye Lee
Sang-Wook Chun
Ho-Jong Kang
Frank E. Talke
Publication date
01-11-2007
Publisher
Springer US
Published in
Tribology Letters / Issue 2/2007
Print ISSN: 1023-8883
Electronic ISSN: 1573-2711
DOI
https://doi.org/10.1007/s11249-007-9255-4

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