2018 | OriginalPaper | Chapter
Anodization process as a structuring technique
Author : Alexey Ivanov
Published in: Silicon Anodization as a Structuring Technique
Publisher: Springer Fachmedien Wiesbaden
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Literature research in sec. 2.6 showed that some separate studies aimed on fabrication of specific structures were performed by different research groups. However, these studies only showed some effects, such as current crowding for insulating frontside masking (for example, Fig. 2.41), without considering complete time evolution of the etch shapes during the process at various conditions. Therefore, in this chapter, for the first time, detailed studies of shape control obtained through localization with basic localization techniques, namely, frontside masking and backside contacts, are presented.