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Electrochemical Study of the Cobalt-Containing and Non-Cobalt-Containing AB5 Alloys Used as Negative Electrodes in Nickel–Metal Hydride Batteries Read chapter Read first chapter

2015 | OriginalPaper | Chapter

62. Characterization and Simulation of Silicon Oxynitride Films Deposited by ECR-PECVD: For Solar Applications

Authors : Lilia Zighed, Abdelhakim Mahdjoub

Published in: Progress in Clean Energy, Volume 2

Publisher: Springer International Publishing

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Abstract

Graded refractive index silicon oxynitrides are deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD). The analysis of engraving speeds and infrared absorption spectra taken on samples informed us about their chemical compositions. This analysis shows the presence of refractive index gradient. To benefit at the same time from antireflective and passive properties of oxynitrides, we proposed graded index layer having Fermi profile, which we optimized by simulation. This coating would replace the classic double layer antireflective coating (ARC) made in two different technological steps. Calculation predicts an enhancement of photogenerated current exceeding 45 % and a weighted reflectance (between 300 and 1,100 nm) around 5.6 %.

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Literature
1.
Mohite KC, Khollam YB, Mandale AB, Patil KR, Takwale MG (2003) Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique. Mater Lett 57(26–27):4170–4175CrossRef
2.
Aspnes DE, Theeten JB (1979) Dielectric function of Si-SiO2 and Si-Si3N4 mixtures. J Appl Phys 50(7):4928–4935CrossRef
3.
Brunet-Bruneau A, Vuye G, Frigerio M, Abelès F, Rivory J, Berger M, Chaton P (1996) Infrared ellipsometry investigation of SiOxNy thin films on silicon. Appl Optics 35(25):4998–5004CrossRef
4.
Szekeres A, Nikolova T, Simeonov S, Gushterov A, Hamelmann F, Heinzmann U (2006) Plasma-assisted chemical vapor deposited silicon oxynitride as an alternative material for gate dielectric in MOS devices. Microelectron J 37(1):64–70CrossRef
5.
Diatezua MD, Thiry PA, Lambin P, Caudano R (1993) Infrared response of silicon oxynitrides investigated by high-resolution electron-energy-loss spectroscopy. Phys Rev B 48(12):8701–8708CrossRef
6.
Pandey RK, Patil LS, Bange JP, Patil DR, Mahajan AM (2004) Growth and characterization of SiON thin films by using thermal-CVD machine. Opt Mater 25(1):1–7CrossRef
7.
Snyder PG, Xiong Y, Woollam A, Al-Jumaily GA, Gagliardi FJ (1992) Graded refractive index silicon oxynitride thin film characterized by spectroscopic ellipsometry. J Vac Sci Tech A 10(4):1462–1466CrossRef
8.
Callard S, Gagnaire A, Joseph J (1997) Fabrication and characterisation of graded refractive index silicon oxynitride thin films. J Vac Sci Tech A 15(4):2088–2094CrossRef
9.
Bulkin PV, Swart PL, Lacquet BM (1995) Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles. J Non-Cryst Sol 187:484–488CrossRef
10.
Pfuch A, Heft A, Weidl R, Lang K (2006) Characterization of SiO2 thin films prepared by plasma-activated chemical vapour deposition. Surf Coat Tech 201(1–2):189–196CrossRef
11.
Vassallo E, Cremona A, Laguardia L, Mesto E (2006) Preparation of plasma-polymerized SiOx-like thin films from a mixture of hexamethyldisiloxane and oxygen to improve the corrosion behaviour. Surf Coat Tech 200(10):3035–3040CrossRef
12.
Rivory J (1998) Characterization of inhomogeneous dielectric films by spectroscopic ellipsometry. Thin Solid Films 313–314:333–340CrossRef
13.
Kildemo M (1998) Real-time monitoring and growth control of Si-gradient-index structures by multiwavelength ellipsometry. Appl Optics 37(1):113–123CrossRef
14.
Orgeret M (1985) Les Piles solaires: Le composant et ses applications. Masson, Paris, p 138
15.
Nubile P (1999) Analytical design for antireflection coatings for silicon photovoltaic devices. Thin Solid Films 342(1–2):257–261CrossRef
16.
Gao L, Gu JZ (2002) Effective dielectric constant of two component material with shape distribution. J Phys D Appl Phys 35(3–7):267–271CrossRef
17.
Palik ED (1985) Handbook of optical constants of solids, Academic Press Handbook series. Academic, Orlando, FL
18.
Mahdjoub A, Zighed L (2005) New designs for graded refractive index antireflection coatings. Thin Solid Films 478(1–2):299–304CrossRef
19.
Lipiński M, Panek P, Beltowska E, Czternastek H (2003) Reduction of surface reflectivity by using double porous silicon layers. Mater Sci Eng B 101(1–3):297–299CrossRef
20.
Strehlke S, Bastide S, Lévy-Clément C (1999) Optimization of porous silicon reflectance for silicon photovoltaic cells. Sol Energy Mater Sol Cells 58(4):399–409CrossRef
21.
Duerincks F, Szlufcik J (2002) Defect passivation of industrial multicrystalline solar cells based on PECVD silicon nitride. Sol Energy Mater Sol Cells 72(1–4):231–246CrossRef
22.
Born M, Wolf E (1970) Principles of optics. Pergamon Press, London, p 228
23.
Ricaud A (1997) Photopile solaire, 1st edn. Presses polytechniques et universitaires Romandes, Lausanne, Switzerland, p 39
24.
Zhao J, Green MA (1991) Optimized antireflection coatings for high-efficiency solar cells. IEEE Trans Electron Devices 38(8):1925–1934CrossRef
25.
Aiken DJ (2000) Antireflection coating design for series interconnected multi-junction solar cells. Prog Photovolt Res Appl 8(6):563–570CrossRef
Metadata
Title
Characterization and Simulation of Silicon Oxynitride Films Deposited by ECR-PECVD: For Solar Applications
Authors
Lilia Zighed
Abdelhakim Mahdjoub
Copyright Year
2015
Book
Progress in Clean Energy, Volume 2

Print ISBN: 978-3-319-17030-5

Electronic ISBN: 978-3-319-17031-2

Copyright Year: 2015

DOI
https://doi.org/10.1007/978-3-319-17031-2_62