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Journal of Materials Science
Published in: Journal of Materials Science 11/2009

01-06-2009

Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques

Authors: Taíse Matte Manhabosco, Iduvirges L. Müller

Published in: Journal of Materials Science | Issue 11/2009

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Abstract

In this study, thin cobalt films were electrodeposited directly onto n-Si (100) using two different electrodeposition techniques: galvanostatic and potentiostatic. The morphological difference between galvanostatic and potentiostatic deposits was observed by atomic force microscopy (AFM) and X-ray diffraction (XRD). Analysis of the deposits by an alternating gradient field magnetometer (AGFM) showed the influence of the electrodeposition process on the magnetic properties of the film.
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Metadata
Title
Deposition of thin cobalt films onto silicon by galvanostatic and potentiostatic techniques
Authors
Taíse Matte Manhabosco
Iduvirges L. Müller
Publication date
01-06-2009
Publisher
Springer US
Published in
Journal of Materials Science / Issue 11/2009
Print ISSN: 0022-2461
Electronic ISSN: 1573-4803
DOI
https://doi.org/10.1007/s10853-009-3388-9

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