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Metallurgical and Materials Transactions A

Effect of Trace Levels of Si on Microstructure and Grain Boundary Segregation in DOP-26 Iridium Alloy

  • 31-10-2017
  • Topical Collection: Next Generation Superalloys and Beyond
Published in:
Authors
Dean Pierce
Govindarajan Muralidharan
Lee Heatherly
Ethan Fox
Published in
Metallurgical and Materials Transactions A | Issue 3/2018

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Abstract

The thermodynamics and kinetics of Silicon (Si) segregation to grain boundaries in Iridium alloy DOP-26 with added trace levels of Si of 6, 11, 29, and 36 wppm was studied by Auger Electron Spectroscopy. The four alloys were annealed at 1500 or 1535 °C for 19 or 76 hours followed by cooling at three different rates. Si enrichment at the grain boundaries (GB) increased with increasing bulk Si content, with the grain boundary Si enrichment factors ranging from 62 to 344, depending on the bulk Si content and the cooling rate. Grain boundary Si contents increased with decreasing cooling rate in all alloys, indicating that Si GB segregation is influenced by both thermodynamic and kinetic factors in the alloys and temperature ranges of the study. A Langmuir-McLean isotherm-based model was successfully used to predict the temperature dependence of GB Si segregation in DOP-26 alloys with Si additions and estimate the temperature independent free energy of Si segregation to grain boundaries in DOP-26.

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previous article Oxidation of Al2O3 Scale-Forming MAX Phases in Turbine Environments
next article Effect of Boron Addition on the Mechanical Wear Resistance of Additively Manufactured Biomedical Titanium Alloy
Title
Effect of Trace Levels of Si on Microstructure and Grain Boundary Segregation in DOP-26 Iridium Alloy
Authors
Dean Pierce
Govindarajan Muralidharan
Lee Heatherly
Ethan Fox
Publication date
31-10-2017
Publisher
Springer US
Published in
Metallurgical and Materials Transactions A / Issue 3/2018
Print ISSN: 1073-5623
Electronic ISSN: 1543-1940
DOI
https://doi.org/10.1007/s11661-017-4357-6
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