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Published in:
23-02-2016
Fabrication of silicon nanorod arrays via a facile metal-assisted chemical etching method
Published in: Journal of Materials Science: Materials in Electronics | Issue 6/2016
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Abstract
Si nanorod arrays exhibit promising potential applications in many fields compared with the bulk counterpart. Therefore, development of a facile and cost-effective method for the fabrication of this kind of nanostructures is essential to enabling a wide range of advanced technologies in electronics and optics. In this paper, a simple and low cost method is presented and the fabrication process includes a combination of polystyrene sphere lithography and metal-assisted chemical etching. Compared with previously reported polystyrene sphere lithography methods, present fabrication has the advantage of simplicity. In addition, the fabrication involves no reactive ion etching equipment or noble metal deposition facilities. Based on the experimental results, a plausible mechanism is proposed to explain the formation of Si nanorod arrays.