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Published in: Microsystem Technologies 3/2018

17-10-2017 | Technical Paper

Hot roller embossing of multi-dimensional microstructures using elastomeric molds

Authors: Z. W. Zhong, H. H. Ng, S. H. Chen, X. C. Shan

Published in: Microsystem Technologies | Issue 3/2018

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Abstract

In this work, we investigated how elastomeric mold properties could affect the final replication accuracy in hot roller embossing. Amorphous polyethylene terephthalate was used as the polymer substrate. It was discovered that for dense features, the elastomeric mold provided better replication results compared to a metal mold. The experimental results revealed that embossing with larger pitch sizes such as 300 and 400 µm achieved better replication accuracy than that with smaller pitch sizes such as 100 and 200 µm. The side-wall surface areas of the features on the mold affected the embossing process, resulting in different degrees of replication accuracy.

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Literature
go back to reference Ahn SH, Guo LJ (2008) High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates. Adv Mater 20(11):2044–2049CrossRef Ahn SH, Guo LJ (2008) High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates. Adv Mater 20(11):2044–2049CrossRef
go back to reference Ahn SH, Guo LJ (2009) Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting. ACS Nano 3(8):2304–2310CrossRef Ahn SH, Guo LJ (2009) Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting. ACS Nano 3(8):2304–2310CrossRef
go back to reference Ahn S, Cha J, Myung H, Kim S-M, Kang S (2006) Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns. Appl Phys Lett 89(21):213101CrossRef Ahn S, Cha J, Myung H, Kim S-M, Kang S (2006) Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns. Appl Phys Lett 89(21):213101CrossRef
go back to reference Chang JH, Cheng FS, Chao CC, Weng YC, Yang SY, Wang LA (2005) Direct imprinting using soft mold and gas pressure for large area and curved surfaces. J Vac Sci Technol A 23(6):1687–1690CrossRef Chang JH, Cheng FS, Chao CC, Weng YC, Yang SY, Wang LA (2005) Direct imprinting using soft mold and gas pressure for large area and curved surfaces. J Vac Sci Technol A 23(6):1687–1690CrossRef
go back to reference Chen SC, Lin MC, Chien RD, Liaw WL (2005) Hot embossing of micro-featured devices. In: Proceedings of the 2005 IEEE international conference on mechatronics, ICM '05, 10–12 July 2005, Taipei, Taiwan, pp 777–782. doi:10.1109/ICMECH.2005.1529360 Chen SC, Lin MC, Chien RD, Liaw WL (2005) Hot embossing of micro-featured devices. In: Proceedings of the 2005 IEEE international conference on mechatronics, ICM '05, 10–12 July 2005, Taipei, Taiwan, pp 777–782. doi:10.​1109/​ICMECH.​2005.​1529360
go back to reference Chou SY, Krauss PR, Renstrom PJ (1995) Imprint of sub-25 nm vias and trenches in polymers. Appl Phys Lett 67(21):3114–3116CrossRef Chou SY, Krauss PR, Renstrom PJ (1995) Imprint of sub-25 nm vias and trenches in polymers. Appl Phys Lett 67(21):3114–3116CrossRef
go back to reference Chou SY, Krauss PR, Renstrom PJ (1996) Imprint lithography with 25-nanometer resolution. Science 272(5258):85–87CrossRef Chou SY, Krauss PR, Renstrom PJ (1996) Imprint lithography with 25-nanometer resolution. Science 272(5258):85–87CrossRef
go back to reference Colburn M, Johnson S, Stewart M, Damle S, Bailey T, Choi B, Wedlake M, Michaelson T, Sreenivasan S, Ekerdt J, Willson C (1999) Step and flash imprint lithography: a new approach to high-resolution patterning, emerging lithographic technologies III. Proc SPIE 3676:379–389CrossRef Colburn M, Johnson S, Stewart M, Damle S, Bailey T, Choi B, Wedlake M, Michaelson T, Sreenivasan S, Ekerdt J, Willson C (1999) Step and flash imprint lithography: a new approach to high-resolution patterning, emerging lithographic technologies III. Proc SPIE 3676:379–389CrossRef
go back to reference Dumond JJ, Low HY (2012) Recent developments and design challenges in continuous roller micro- and nanoimprinting. J Vac Sci Technol B 30(1):010801CrossRef Dumond JJ, Low HY (2012) Recent developments and design challenges in continuous roller micro- and nanoimprinting. J Vac Sci Technol B 30(1):010801CrossRef
go back to reference Fagan MD, Kim BH, Yao D (2009) A novel process for continuous thermal embossing of large-area nanopatterns onto polymer films. Adv Polym Technol 28(4):246–256CrossRef Fagan MD, Kim BH, Yao D (2009) A novel process for continuous thermal embossing of large-area nanopatterns onto polymer films. Adv Polym Technol 28(4):246–256CrossRef
go back to reference Goral VN, Hsieh YC, Petzold ON, Faris RA, Yuen PK (2010) Hot embossing of plastic microfluidic devices using poly(dimethylsiloxane) molds. In: 14th international conference on miniaturized systems for chemistry and life sciences 2010, MicroTAS 2010, 3–7 Oct 2010, Groningen, The Netherlands, pp 1214–1216 Goral VN, Hsieh YC, Petzold ON, Faris RA, Yuen PK (2010) Hot embossing of plastic microfluidic devices using poly(dimethylsiloxane) molds. In: 14th international conference on miniaturized systems for chemistry and life sciences 2010, MicroTAS 2010, 3–7 Oct 2010, Groningen, The Netherlands, pp 1214–1216
go back to reference Guo LJ (2004) Recent progress in nanoimprint technology and its applications. J Phys D Appl Phys 37(11):R123–R141CrossRef Guo LJ (2004) Recent progress in nanoimprint technology and its applications. J Phys D Appl Phys 37(11):R123–R141CrossRef
go back to reference Guo LJ (2007) Nanoimprint lithography: methods and material requirements. Adv Mater 19(4):495–513CrossRef Guo LJ (2007) Nanoimprint lithography: methods and material requirements. Adv Mater 19(4):495–513CrossRef
go back to reference Ishizawa N, Idei K, Kimura T, Noda D, Hattori T (2008) Resin micromachining by roller hot embossing. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 14(9–11):1381–1388 Ishizawa N, Idei K, Kimura T, Noda D, Hattori T (2008) Resin micromachining by roller hot embossing. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 14(9–11):1381–1388
go back to reference Jiang LT, Huang TC, Chang CY, Ciou JR, Yang SY, Huang PH (2008) Direct fabrication of rigid microstructures on a metallic roller using a dry film resist. J Micromech Microeng 18(1):015004CrossRef Jiang LT, Huang TC, Chang CY, Ciou JR, Yang SY, Huang PH (2008) Direct fabrication of rigid microstructures on a metallic roller using a dry film resist. J Micromech Microeng 18(1):015004CrossRef
go back to reference Koo N, Otto M, Kim JW, Jeong JH, Kurz H (2011) Press and release imprint: control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL. Microelectron Eng 88(6):1033–1036CrossRef Koo N, Otto M, Kim JW, Jeong JH, Kurz H (2011) Press and release imprint: control of the flexible mold deformation and the local variation of residual layer thickness in soft UV-NIL. Microelectron Eng 88(6):1033–1036CrossRef
go back to reference Kooy N, Mohamed K, Pin LT, Guan OS (2014) A review of roll-to-roll nanoimprint lithography. Nanoscale Res Lett 9:320CrossRef Kooy N, Mohamed K, Pin LT, Guan OS (2014) A review of roll-to-roll nanoimprint lithography. Nanoscale Res Lett 9:320CrossRef
go back to reference Kunnavakkam MV, Houlihan FM, Schlax M, Liddle JA, Kolodner P, Nalamasu O, Rogers JA (2003) Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process. Appl Phys Lett 82(8):1152–1154CrossRef Kunnavakkam MV, Houlihan FM, Schlax M, Liddle JA, Kolodner P, Nalamasu O, Rogers JA (2003) Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process. Appl Phys Lett 82(8):1152–1154CrossRef
go back to reference Lee J, Park S, Choi K, Kim G (2008) Nano-scale patterning using the roll typed UV-nanoimprint lithography tool. Microelectron Eng 85(5–6):861–865CrossRef Lee J, Park S, Choi K, Kim G (2008) Nano-scale patterning using the roll typed UV-nanoimprint lithography tool. Microelectron Eng 85(5–6):861–865CrossRef
go back to reference Lee YC, Chen BT, Wu TH, Chou YY (2012) Full wafer microstructure fabrication by continuous UV-assisted roller imprinting lithography to enhance light extraction of LEDs. Microelectron Eng 91:64–69CrossRef Lee YC, Chen BT, Wu TH, Chou YY (2012) Full wafer microstructure fabrication by continuous UV-assisted roller imprinting lithography to enhance light extraction of LEDs. Microelectron Eng 91:64–69CrossRef
go back to reference Li JM, Liu C, Peng J (2008) Effect of hot embossing process parameters on polymer flow and microchannel accuracy produced without vacuum. J Mater Process Technol 207(1–3):163–171CrossRef Li JM, Liu C, Peng J (2008) Effect of hot embossing process parameters on polymer flow and microchannel accuracy produced without vacuum. J Mater Process Technol 207(1–3):163–171CrossRef
go back to reference Lin M-C, Yeh J-P, Chen S-C, Chien R-D, Hsu C-L (2013) Study on the replication accuracy of polymer hot embossed microchannels. Int Commun Heat Mass Transf 42:55–61CrossRef Lin M-C, Yeh J-P, Chen S-C, Chien R-D, Hsu C-L (2013) Study on the replication accuracy of polymer hot embossed microchannels. Int Commun Heat Mass Transf 42:55–61CrossRef
go back to reference McClelland GM, Hart MW, Rettner CT, Best ME, Carter KR, Terris BD (2002) Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold. Appl Phys Lett 81(8):1483–1485CrossRef McClelland GM, Hart MW, Rettner CT, Best ME, Carter KR, Terris BD (2002) Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold. Appl Phys Lett 81(8):1483–1485CrossRef
go back to reference Ng HHS (2016) Numerical and experimental study of micro feature replication with PDMS mold. Report of Project B223. Nanyang Technological University, Singapore Ng HHS (2016) Numerical and experimental study of micro feature replication with PDMS mold. Report of Project B223. Nanyang Technological University, Singapore
go back to reference Peng L, Deng Y, Yi P, Lai X (2014) Micro hot embossing of thermoplastic polymers: a review. J Micromech Microeng 24(1):013001CrossRef Peng L, Deng Y, Yi P, Lai X (2014) Micro hot embossing of thermoplastic polymers: a review. J Micromech Microeng 24(1):013001CrossRef
go back to reference Rogers JA, Lee HH (2008) Unconventional nanopatterning techniques and applications. Wiley, HobokenCrossRef Rogers JA, Lee HH (2008) Unconventional nanopatterning techniques and applications. Wiley, HobokenCrossRef
go back to reference Schift H (2008) Nanoimprint lithography: an old story in modern times? A review. J Vac Sci Technol B Microelectron Nanomater Struct 26(2):458–480CrossRef Schift H (2008) Nanoimprint lithography: an old story in modern times? A review. J Vac Sci Technol B Microelectron Nanomater Struct 26(2):458–480CrossRef
go back to reference Schvartzman M, Nguyen K, Palma M, Abramson J, Sable J, Hone J, Sheetz MP, Wind SJ (2009) Fabrication of nanoscale bioarrays for the study of cytoskeletal protein binding interactions using nanoimprint lithography. J Vac Sci Technol B 27(1):61–65CrossRef Schvartzman M, Nguyen K, Palma M, Abramson J, Sable J, Hone J, Sheetz MP, Wind SJ (2009) Fabrication of nanoscale bioarrays for the study of cytoskeletal protein binding interactions using nanoimprint lithography. J Vac Sci Technol B 27(1):61–65CrossRef
go back to reference Shan XC, Liu YC, Lam YC (2008a) Studies of polymer deformation and recovery in micro hot embossing. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 14(7):1055–1060 Shan XC, Liu YC, Lam YC (2008a) Studies of polymer deformation and recovery in micro hot embossing. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 14(7):1055–1060
go back to reference Shan XC, Soh YC, Shi CWP, Tay CK, Chua KM, Lu CW (2008b) Large-area patterning of multilayered green ceramic substrates using micro roller embossing. J Micromech Microeng 18(6):065007CrossRef Shan XC, Soh YC, Shi CWP, Tay CK, Chua KM, Lu CW (2008b) Large-area patterning of multilayered green ceramic substrates using micro roller embossing. J Micromech Microeng 18(6):065007CrossRef
go back to reference Shan XC, Soh YC, Shi CWP, Jin L, Lu CW (2009) A micro roller embossing process for structuring large-area substrates of laminated ceramic green tapes. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 15(8):1319–1325 Shan XC, Soh YC, Shi CWP, Jin L, Lu CW (2009) A micro roller embossing process for structuring large-area substrates of laminated ceramic green tapes. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 15(8):1319–1325
go back to reference Shan XC, Lau SK, Mohahidin MB, Liu T, Lu ACW (2011) Formation of large format functional films via roll-to-roll (R2R) ultraviolet (UV) embossing. In: IEEE 13th electronics packaging technology conference, 7–9 Dec 2011, Singapore, pp 521–524. doi:10.1109/EPTC.2011.6184476 Shan XC, Lau SK, Mohahidin MB, Liu T, Lu ACW (2011) Formation of large format functional films via roll-to-roll (R2R) ultraviolet (UV) embossing. In: IEEE 13th electronics packaging technology conference, 7–9 Dec 2011, Singapore, pp 521–524. doi:10.​1109/​EPTC.​2011.​6184476
go back to reference Singh K, Dupaix RB (2012) Hot-embossing experiments of polymethyl methacrylate across the glass transition temperature with variation in temperature and hold times. Polym Eng Sci 52(6):1284–1292CrossRef Singh K, Dupaix RB (2012) Hot-embossing experiments of polymethyl methacrylate across the glass transition temperature with variation in temperature and hold times. Polym Eng Sci 52(6):1284–1292CrossRef
go back to reference Sohn K-J, Park JH, Lee D-E, Jang H-I, Lee WI (2013) Effects of the process temperature and rolling speed on the thermal roll-to-roll imprint lithography of flexible polycarbonate film. J Micromech Microeng 23(3):035024CrossRef Sohn K-J, Park JH, Lee D-E, Jang H-I, Lee WI (2013) Effects of the process temperature and rolling speed on the thermal roll-to-roll imprint lithography of flexible polycarbonate film. J Micromech Microeng 23(3):035024CrossRef
go back to reference Vogler M, Wiedenberg S, Muehlberger M, Bergmair I, Glinsner T, Schmidt H, Kley E-B, Gruetzner G (2007) Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography. Microelectron Eng 84(5–8):984–988CrossRef Vogler M, Wiedenberg S, Muehlberger M, Bergmair I, Glinsner T, Schmidt H, Kley E-B, Gruetzner G (2007) Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography. Microelectron Eng 84(5–8):984–988CrossRef
go back to reference Weng YJ, Weng YC, Yang SY, Wong JL (2009) A novel electromagnetism-assisted imprinting technology to replicate microstructures onto a large-area curved surface using a flexible magnetic mold. Polym Adv Technol 20(2):92–97CrossRef Weng YJ, Weng YC, Yang SY, Wong JL (2009) A novel electromagnetism-assisted imprinting technology to replicate microstructures onto a large-area curved surface using a flexible magnetic mold. Polym Adv Technol 20(2):92–97CrossRef
go back to reference Xia Q, Yang JJ, Wu W, Li X, Williams RS (2010) Self-aligned memristor cross-point arrays fabricated with one nanoimprint lithography step. Nano Lett 10(8):2909–2914CrossRef Xia Q, Yang JJ, Wu W, Li X, Williams RS (2010) Self-aligned memristor cross-point arrays fabricated with one nanoimprint lithography step. Nano Lett 10(8):2909–2914CrossRef
go back to reference Yeo LP, Ng SH, Wang ZF, Xia HM, Wang ZP, Thang VS, Zhong ZW, de Rooij NF (2010) Investigation of hot roller embossing for microfluidic devices. J Micromech Microeng 20(1):015017CrossRef Yeo LP, Ng SH, Wang ZF, Xia HM, Wang ZP, Thang VS, Zhong ZW, de Rooij NF (2010) Investigation of hot roller embossing for microfluidic devices. J Micromech Microeng 20(1):015017CrossRef
go back to reference Zhong ZW, Shan XC (2012) Microstructure formation via roll-to-roll UV embossing using a flexible mould made from a laminated polymer-copper film. J Micromech Microeng 22(8):085010MathSciNetCrossRef Zhong ZW, Shan XC (2012) Microstructure formation via roll-to-roll UV embossing using a flexible mould made from a laminated polymer-copper film. J Micromech Microeng 22(8):085010MathSciNetCrossRef
go back to reference Zhong ZW, Shan XC (2014) A study of meniscus formation and its effect on roll-to-roll UV embossing. Int J Eng Sci 85:10–19CrossRef Zhong ZW, Shan XC (2014) A study of meniscus formation and its effect on roll-to-roll UV embossing. Int J Eng Sci 85:10–19CrossRef
go back to reference Zhong ZW, Shan XC, Yao YC (2010) investigation of antiadhesive coatings for nanoimprinting lithography. Mater Manuf Process 25(7):658–664CrossRef Zhong ZW, Shan XC, Yao YC (2010) investigation of antiadhesive coatings for nanoimprinting lithography. Mater Manuf Process 25(7):658–664CrossRef
go back to reference Zhong ZW, Shan XC, Wong SJ (2011) Roll-to-roll large-format slot die coating of photosensitive resin for UV embossing. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 17(12):1703–1711 Zhong ZW, Shan XC, Wong SJ (2011) Roll-to-roll large-format slot die coating of photosensitive resin for UV embossing. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 17(12):1703–1711
go back to reference Zhong ZW, Shan XC, Lim YZ (2015) The edge-effect on roll-to-roll thermal embossing of micro channels. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 21(6):1267–1273 Zhong ZW, Shan XC, Lim YZ (2015) The edge-effect on roll-to-roll thermal embossing of micro channels. Microsyst Technol Micro Nanosyst Inf Storage Process Syst 21(6):1267–1273
Metadata
Title
Hot roller embossing of multi-dimensional microstructures using elastomeric molds
Authors
Z. W. Zhong
H. H. Ng
S. H. Chen
X. C. Shan
Publication date
17-10-2017
Publisher
Springer Berlin Heidelberg
Published in
Microsystem Technologies / Issue 3/2018
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-017-3584-5

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