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2017 | OriginalPaper | Chapter

3. In Situ High-Temperature X-ray Diffraction of Thin Films: Chemical Expansion and Kinetics

Authors : Jose Santiso, Roberto Moreno

Published in: Electro-Chemo-Mechanics of Solids

Publisher: Springer International Publishing

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Abstract

This chapter reviews the use of in-situ X-ray diffraction analyses for exploring the chemical expansion produced by oxygen stoichiometry changes in thin oxide films during oxidation and reduction, as well as the kinetics of oxygen exchange at the surface of the films. This technique has demonstated to serve as a non-invasive and very selective complementary tool for fundamental studies on mixed ionic-electronic conducting materials.

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previous chapter Conventional Methods for Measurements of Chemo-Mechanical Coupling
next chapter In-Situ Neutron Diffraction Experiments
Footnotes
1
The assumption that oxygen defects concentration profile is homogenous in the whole film thickness is not entirely true. In some cases the XRD peaks show a slight broadening after film oxidation, compared to a narrower peak attained after lower pO2 conditions. This is an indication that the film may develop a chemical expansion profile across the thickness depending on the strain imposed by the substrate mismatch.
 
2
In this heterostructure the GDC interlayer only acts as a barrier to prevent the chemical reaction between LSCF cathode and YSZ electrolyte.
 
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Metadata
Title
In Situ High-Temperature X-ray Diffraction of Thin Films: Chemical Expansion and Kinetics
Authors
Jose Santiso
Roberto Moreno
Copyright Year
2017
Book
Electro-Chemo-Mechanics of Solids

Print ISBN: 978-3-319-51405-5

Electronic ISBN: 978-3-319-51407-9

Copyright Year: 2017

DOI
https://doi.org/10.1007/978-3-319-51407-9_3

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