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2007 | OriginalPaper | Chapter

7. Introduction to Micro/Nanofabrication

Authors : Babak Ziaie, Prof., Antonio Baldi, Prof., Massood Atashbar, Prof.

Published in: Springer Handbook of Nanotechnology

Publisher: Springer Berlin Heidelberg

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Abstract

This chapter outlines and discusses important micro- and nanofabrication techniques. We start with the most basic methods borrowed from the integrated circuit (IC) industry, such as thin film deposition, lithography and etching, and then move on to look at MEMS and nanofabrication technologies. We cover a broad range of dimensions, from the micron to the nanometer scale. Although most of the current research is geared towards the nanodomain, a good understanding of top-down methods for fabricating micron-sized objects can aid our understanding of this research. Due to space constraints, we have focused here on the most important technologies; in the microdomain these include surface, bulk and high aspect ratio micromachining; in the nanodomain we concentrate on e-beam lithography, epitaxial growth, template manufacturing and self-assembly. MEMS technology is maturing rapidly, with some new technologies displacing older ones that have proven to be unsuited to manufacture on a commercial scale. However, the jury is still out on methods used in the nanodomain, although it appears that bottom-up methods are the most feasible, and these will have a major impact in a variety of application areas such as biology, medicine, environmental monitoring and nanoelectronics.

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Title: Introduction to Micro/Nanofabrication
Authors: Babak Ziaie, Prof.
Antonio Baldi, Prof.
Massood Atashbar, Prof.
Publisher: Springer Berlin Heidelberg
Book: Springer Handbook of Nanotechnology
Print ISBN: 978-3-540-29855-7

Electronic ISBN: 978-3-540-29857-1

Copyright Year: 2007
DOI: https://doi.org/10.1007/978-3-540-29857-1_7

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