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Published in:
Cover of the book

2018 | OriginalPaper | Chapter

1. Introduction

Authors : Seongbo Shim, Youngsoo Shin

Published in: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Publisher: Springer International Publishing

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Abstract

It is now well known that the scaling of devices is approaching fundamental as well as economic limit. This is mainly because traditional optical lithography is facing substantial challenges for printing fine features while maintaining a reasonable cost. Alternative patterning approaches for next generation lithography have been actively studied. Examples include extreme ultraviolet lithography (EUVL), electron beam lithography (EBL), and nanoimprint lithography (NIL). However, all of them involve high cost or low throughput, and so are not yet practical solution. Directed self-assembly lithography (DSAL), the focus of this book, is a practical solution and is believed to be the most promising technique for contact and via patterns in technology node of 7 nm and below.

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Footnotes
1
Practical limit of \(k_{1}\) is believed to be about 0.27 [2].
 
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Metadata
Title
Introduction
Authors
Seongbo Shim
Youngsoo Shin
Copyright Year
2018
Book
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Print ISBN: 978-3-319-76293-7

Electronic ISBN: 978-3-319-76294-4

Copyright Year: 2018

DOI
https://doi.org/10.1007/978-3-319-76294-4_1

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