Skip to main content
Top

2018 | OriginalPaper | Chapter

2. DSAL Manufacturability

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

Abstract

In DSAL, contacts (or vias) are patterned in two steps. A GP that surrounds a group of nearby contacts forms on a wafer through optical lithography; member contacts then form through DSA process that arises within a GP. Final contact shape can be predicted by two sequential simulations: lithography simulation to predict GP shape and DSA simulation to predict contact. In reality, the two simulations should be repeated to account for lithography as well as DSA variations.

Dont have a licence yet? Then find out more about our products and how to get one now:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Literature
1.
go back to reference H. Yi, X. Bao, R. Tiberio, P. Wong, Design strategy of small topographical guiding templates for sub-15nm integrated circuits contact hole patterns using block copolymer directed self-assembly, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–9 H. Yi, X. Bao, R. Tiberio, P. Wong, Design strategy of small topographical guiding templates for sub-15nm integrated circuits contact hole patterns using block copolymer directed self-assembly, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–9
2.
go back to reference L. Liebmann, S. Mansfield, G. Han, J. Culp, J. Hibbeler, R. Tsai, Reducing DfM to practice: the lithography manufacturability assessor, in Proceedings SPIE Advanced Lithography (2006), pp. 786–798 L. Liebmann, S. Mansfield, G. Han, J. Culp, J. Hibbeler, R. Tsai, Reducing DfM to practice: the lithography manufacturability assessor, in Proceedings SPIE Advanced Lithography (2006), pp. 786–798
3.
go back to reference J.P. Cain, Design for manufacturability: a fabless perspective, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–9 J.P. Cain, Design for manufacturability: a fabless perspective, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–9
4.
go back to reference K. Peter, R. Marz, S. Grondahl, W. Maurer, Litho-friendly design (LfD) methodologies applied to library cells, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–9 K. Peter, R. Marz, S. Grondahl, W. Maurer, Litho-friendly design (LfD) methodologies applied to library cells, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–9
5.
go back to reference H.D. Ceniceros, G.H. Fredrickson, Numerical solution of polymer self-consistent field theory. Multiscale Model. Simul. 2(3), 452–474 (2004)CrossRef H.D. Ceniceros, G.H. Fredrickson, Numerical solution of polymer self-consistent field theory. Multiscale Model. Simul. 2(3), 452–474 (2004)CrossRef
6.
go back to reference N. Laachi, K.T. Delaney, B. Kim, S. Hur, R. Bristol, D. Shykind, C.J. Weinheimer, G.H. Fredrickson, Self-consistent field theory investigation of directed self-assembly in cylindrical confinement. J. Polym. Sci. Part B Polym. Phys. 53(2), 142–153 (2015)CrossRef N. Laachi, K.T. Delaney, B. Kim, S. Hur, R. Bristol, D. Shykind, C.J. Weinheimer, G.H. Fredrickson, Self-consistent field theory investigation of directed self-assembly in cylindrical confinement. J. Polym. Sci. Part B Polym. Phys. 53(2), 142–153 (2015)CrossRef
7.
go back to reference S. Shim, Y. Shin, Mask optimization for directed self-assembly lithography: inverse DSA and inverse lithography, in Proceedings of the Asia South Pacific Design Automation Conference (2016), pp. 83–88 S. Shim, Y. Shin, Mask optimization for directed self-assembly lithography: inverse DSA and inverse lithography, in Proceedings of the Asia South Pacific Design Automation Conference (2016), pp. 83–88
8.
go back to reference S. Shim, W. Chung, Y. Shin, Defect probability of directed self-assembly lithography: fast identification and post-placement optimization, in Proceedings of the International Conference on Computer Aided Design (2015), pp. 404–409 S. Shim, W. Chung, Y. Shin, Defect probability of directed self-assembly lithography: fast identification and post-placement optimization, in Proceedings of the International Conference on Computer Aided Design (2015), pp. 404–409
9.
go back to reference W. Chung, S. Shim, Y. Shin, Redundant via insertion in directed self-assembly lithography, in Proceedings of the Design, Automation and Test in Europe Conference and Exhibition (2016), pp. 55–60 W. Chung, S. Shim, Y. Shin, Redundant via insertion in directed self-assembly lithography, in Proceedings of the Design, Automation and Test in Europe Conference and Exhibition (2016), pp. 55–60
10.
go back to reference Samsung Electronics Corp. DFM Principal Engineer, Personal Communication (2015) Samsung Electronics Corp. DFM Principal Engineer, Personal Communication (2015)
11.
go back to reference Samsung Electronics Corp. OPC Principal Engineer, Personal Communication (2015) Samsung Electronics Corp. OPC Principal Engineer, Personal Communication (2015)
12.
go back to reference H. Yi, L. Azat, P. Wong, Computational simulation of block copolymer directed self-assembly in small topographical guiding templates, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–7 H. Yi, L. Azat, P. Wong, Computational simulation of block copolymer directed self-assembly in small topographical guiding templates, in Proceedings of the SPIE Advanced Lithography (2013), pp. 1–7
13.
go back to reference M. C. Smayling, V. Axelrad, 32nm and below logic patterning using optimized illumination and double patterning, in Proceedings of the SPIE Advanced Lithography (2009), pp. 1–10 M. C. Smayling, V. Axelrad, 32nm and below logic patterning using optimized illumination and double patterning, in Proceedings of the SPIE Advanced Lithography (2009), pp. 1–10
Metadata
Title
DSAL Manufacturability
Authors
Seongbo Shim
Youngsoo Shin
Copyright Year
2018
DOI
https://doi.org/10.1007/978-3-319-76294-4_2

Premium Partners