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2018 | OriginalPaper | Chapter

Investigation of Titanium Aluminium Nitride (TiAlN): A Review

Authors : Soham Das, Bibhu Prasad Swain

Published in: Advances in Electronics, Communication and Computing

Publisher: Springer Singapore

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Abstract

Titanium aluminium nitride (TiAlN) thin films are now commonly used as protective layer in various fields as these films have high thermal stability and sound corrosion resistance. Due to high hardness and wear resistance at elevated temperature, it is one of the most important thin film coating material for cutting tools. Various deposition methods such as physical vapour deposition (PVD), chemical vapour deposition (CVD), sputtering technique, etc., are used by many researchers to synthesize TiAlN coatings. To analyse morphological, structural, and mechanical characteristics, various tests such as SEM, AFM, xrd, Raman, and nanoindentation have been carried out by many researchers. This paper basically summarizes the properties of TiAlN monolayer, nanolayer, and multilayer thin films.

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Metadata
Title
Investigation of Titanium Aluminium Nitride (TiAlN): A Review
Authors
Soham Das
Bibhu Prasad Swain
Copyright Year
2018
Publisher
Springer Singapore
Book
Advances in Electronics, Communication and Computing

Print ISBN: 978-981-10-4764-0

Electronic ISBN: 978-981-10-4765-7

Copyright Year: 2018

DOI
https://doi.org/10.1007/978-981-10-4765-7_16