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Erschienen in:
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2018 | OriginalPaper | Buchkapitel

Investigation of Titanium Aluminium Nitride (TiAlN): A Review

verfasst von : Soham Das, Bibhu Prasad Swain

Erschienen in: Advances in Electronics, Communication and Computing

Verlag: Springer Singapore

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Abstract

Titanium aluminium nitride (TiAlN) thin films are now commonly used as protective layer in various fields as these films have high thermal stability and sound corrosion resistance. Due to high hardness and wear resistance at elevated temperature, it is one of the most important thin film coating material for cutting tools. Various deposition methods such as physical vapour deposition (PVD), chemical vapour deposition (CVD), sputtering technique, etc., are used by many researchers to synthesize TiAlN coatings. To analyse morphological, structural, and mechanical characteristics, various tests such as SEM, AFM, xrd, Raman, and nanoindentation have been carried out by many researchers. This paper basically summarizes the properties of TiAlN monolayer, nanolayer, and multilayer thin films.

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Vorheriges Kapitel Improved Normalization Approach for Iris Image Classification Using SVM
Nächstes Kapitel The Study of GPR with Conducting Surfaces to Determine the Operating Frequency in Single-Fold Reflection Profiling
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Metadaten
Titel
Investigation of Titanium Aluminium Nitride (TiAlN): A Review
verfasst von
Soham Das
Bibhu Prasad Swain
Copyright-Jahr
2018
Verlag
Springer Singapore
Buch
Advances in Electronics, Communication and Computing

Print ISBN: 978-981-10-4764-0

Electronic ISBN: 978-981-10-4765-7

Copyright-Jahr: 2018

DOI
https://doi.org/10.1007/978-981-10-4765-7_16

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