Laser scanning based on nanofabrication for ion beam photogrammetry mapping analysis using carbon coated optical silicon insulator

OPAs (On-chip optical phased arrays) are enabling method for a variety of applications, including metrology, LIDAR (light detection and ranging), and optical interconnects. OPAs must achieve a low beam width, wide-angle steering, effective sidelobe suppression, and other performance requirements. Presence of grating sidelobes from these array configurations in far-field pattern makes it difficult to guide a beam without aliasing when antenna element spacing is more than half a wavelength. Either 1D linear or 2D rectangular arrays make up majority of OPA configurations. This research proposes novel technique for analyzing the laser scanning by ion beam with photogrammetry mapping analysis and nanofabrication. The nanofabrication is carried out using carbon coated optical silicon insulator. The bandwidth restrictions of their antennas as well as photoconductor parasitic have limited the operation bandwidth of previously exhibited plasmonic photoconductive antennas. Here, we demonstrate a potent method for fabricating large-area plasmonic photoconductive nano-antenna arrays that can be used to create broadband terahertz detectors. Signal-to-noise ratio, beam steering step response, beam divergence, power consumption, and scalability are all included in the simulation analysis.