Skip to main content
Top

2017 | OriginalPaper | Chapter

4. Lateral GaN Devices for Power Applications (from kHz to GHz)

Authors : Umesh K. Mishra, Matthew Guidry

Published in: Power GaN Devices

Publisher: Springer International Publishing

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

Abstract

GaN and related materials have exploded onto the semiconductor landscape because of the broad range of applications that they address. The most visible is that it has enabled the solid-state lighting revolution with GaN-based LEDs now replacing incandescent and fluorescent light bulbs because of both their low cost and return on investment due to electricity savings afforded by their enhanced efficiency. GaN has also enabled full color displays from cell phones to stadiums, automotive and airplane mood cabin lighting to head lamps based on LEDs and most recently lasers. These are just a few of the applications that have created a >$10B and rapidly expanding market. In the wake of the photonics applications, GaN electronic applications are now emerging in their own right to serve a multi-billion market from cell phone infrastructure to RADAR and communications to power conversion applications. The dominant device that is used for electronic applications is the AlGaN/GaN HEMT. This chapter will address the materials aspects (briefly) and the various device designs that are of value in different applications.

Dont have a licence yet? Then find out more about our products and how to get one now:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Literature
1.
go back to reference Asif Khan M, Bhattarai A, Kuznia JN, Olson DT (1993) High electron mobility transistor based on a GaN AlxGa1−xN heterojunction. Appl Phys Lett 63(9):1214–1215 Asif Khan M, Bhattarai A, Kuznia JN, Olson DT (1993) High electron mobility transistor based on a GaN AlxGa1−xN heterojunction. Appl Phys Lett 63(9):1214–1215
2.
go back to reference Asif Khan M, Kuznia JN, Olson DT, Schaff WJ, Burm JW, Shur MS (1994) Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor. Appl Phys Lett 65(9):1121–1123 Asif Khan M, Kuznia JN, Olson DT, Schaff WJ, Burm JW, Shur MS (1994) Microwave performance of a 0.25 μm gate AlGaN/GaN heterostructure field effect transistor. Appl Phys Lett 65(9):1121–1123
3.
go back to reference Wu YF, Keller BP, Keller S, Kapolnek D, Denbaars SP, Mishra UK (1996) Measured microwave power performance of AlGaN/GaN MODFET. IEEE Electron Device Lett 17(9):455–457CrossRef Wu YF, Keller BP, Keller S, Kapolnek D, Denbaars SP, Mishra UK (1996) Measured microwave power performance of AlGaN/GaN MODFET. IEEE Electron Device Lett 17(9):455–457CrossRef
4.
go back to reference Keller S, Wu YF, Parish G, Ziang N, Xu JJ, Keller BP, DenBaars SP, Mishra UK (2001) Gallium nitride based high power heterojunction field effect transistors: Process development and present status at UCSB. IEEE Trans Electron Devices 48(3):552–559CrossRef Keller S, Wu YF, Parish G, Ziang N, Xu JJ, Keller BP, DenBaars SP, Mishra UK (2001) Gallium nitride based high power heterojunction field effect transistors: Process development and present status at UCSB. IEEE Trans Electron Devices 48(3):552–559CrossRef
5.
go back to reference Wu YF, Keller BP, Keller S, Xu JJ, Thibeault BJ, Denbaars SP, Mishra UK (1999) GaN-based FETs for microwave power amplification. Ieice Trans Electron E82C(11):1895–1905 Wu YF, Keller BP, Keller S, Xu JJ, Thibeault BJ, Denbaars SP, Mishra UK (1999) GaN-based FETs for microwave power amplification. Ieice Trans Electron E82C(11):1895–1905
6.
go back to reference Green BM, Chu KK, Chumbes EM, Smart JA, Shealy JR, Eastman LF (2000) Effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMT’s. IEEE Electron Device Lett 21(6):268–270CrossRef Green BM, Chu KK, Chumbes EM, Smart JA, Shealy JR, Eastman LF (2000) Effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMT’s. IEEE Electron Device Lett 21(6):268–270CrossRef
7.
go back to reference Wu YF, Zhang N, Xu J, McCarthy L (2003) Group III nitride based FETs and HEMTs with reduced trapping and method for producing the same. US Patent 6 586 781 Wu YF, Zhang N, Xu J, McCarthy L (2003) Group III nitride based FETs and HEMTs with reduced trapping and method for producing the same. US Patent 6 586 781
8.
go back to reference Wu Y, Kapolnek D, Ibbetson J (1999) High Al-content AlGaN/GaN HEMTs on SiC substrates with very high power performance. Electron Devices 20(4):925–927 Wu Y, Kapolnek D, Ibbetson J (1999) High Al-content AlGaN/GaN HEMTs on SiC substrates with very high power performance. Electron Devices 20(4):925–927
9.
go back to reference Chini A, Buttari D, Coffie R, Heikman S, Keller S, Mishra UK (2004) 12 W∕mm power density AlGaN∕GaN HEMTs on sapphire substrate. Electron Lett 40(1):73CrossRef Chini A, Buttari D, Coffie R, Heikman S, Keller S, Mishra UK (2004) 12 W∕mm power density AlGaN∕GaN HEMTs on sapphire substrate. Electron Lett 40(1):73CrossRef
10.
go back to reference Ando Y, Okamoto Y, Miyamoto H, Nakayama T, Inoue T, Kuzuhara M (2003) 10-W/mm AlGaN-GaN HFET with a field modulating plate. IEEE Electron Device Lett 24(5):289–291CrossRef Ando Y, Okamoto Y, Miyamoto H, Nakayama T, Inoue T, Kuzuhara M (2003) 10-W/mm AlGaN-GaN HFET with a field modulating plate. IEEE Electron Device Lett 24(5):289–291CrossRef
11.
go back to reference Wu Y-F, Saxler A, Moore M, Smith RP, Sheppard S, Chavarkar PM, Wisleder T, Mishra UK, Parikh P (2004) 30-W/mm GaN HEMTs by field plate optimization. IEEE Electron Device Lett 25(3):117–119CrossRef Wu Y-F, Saxler A, Moore M, Smith RP, Sheppard S, Chavarkar PM, Wisleder T, Mishra UK, Parikh P (2004) 30-W/mm GaN HEMTs by field plate optimization. IEEE Electron Device Lett 25(3):117–119CrossRef
12.
go back to reference Wu Y-F, Moore M, Wisleder T, Chavarkar PM, Mishra UK, Parikh P (2004) High-gain microwave GaN HEMTs with source-terminated field-plates. IEDM Tech Dig IEEE Int Electron Devices Meet 25(3):1078–1079 Wu Y-F, Moore M, Wisleder T, Chavarkar PM, Mishra UK, Parikh P (2004) High-gain microwave GaN HEMTs with source-terminated field-plates. IEDM Tech Dig IEEE Int Electron Devices Meet 25(3):1078–1079
13.
go back to reference Mishra UK, Shen L, Kazior TE, Wu Y-F (2008) GaN-based RF power devices and amplifiers. Proc IEEE 96(2):287–305 Mishra UK, Shen L, Kazior TE, Wu Y-F (2008) GaN-based RF power devices and amplifiers. Proc IEEE 96(2):287–305
14.
go back to reference Wu Y-F, Moore M, Saxler A, Wisleder T, Parikh P (2006) 40-W/mm double field-plated GaN HEMTs. In: 2006 64th device research conference, pp 2005–2006 Wu Y-F, Moore M, Saxler A, Wisleder T, Parikh P (2006) 40-W/mm double field-plated GaN HEMTs. In: 2006 64th device research conference, pp 2005–2006
15.
go back to reference Lee C, Salzman K, Coffie R, Li V, Drandova G, Nagle T, Morgan D, Horng P, Hillyard S, Ruan J (2013) GaN on SiC HEMT process. In: Proceedings of the CS MANTECH conference, pp 91–94 Lee C, Salzman K, Coffie R, Li V, Drandova G, Nagle T, Morgan D, Horng P, Hillyard S, Ruan J (2013) GaN on SiC HEMT process. In: Proceedings of the CS MANTECH conference, pp 91–94
16.
go back to reference Himes G, Maunder D, Kopp B (2013) Recent defense production act title III investments in compound semiconductor manufacturing readiness. In: Proceedings CS MANTECH conference, pp 83–86 Himes G, Maunder D, Kopp B (2013) Recent defense production act title III investments in compound semiconductor manufacturing readiness. In: Proceedings CS MANTECH conference, pp 83–86
17.
go back to reference Fury R, Sheppard ST, Barner JB, Pribble B, Fisher J, Gajewski DA, Radulescu F, Hagleitner H, Namishia D, Ring Z, Gao J, Lee S, Fetzer B, Mcfarland R, Milligan J, Palmour J (2013) GaN-on-SiC MMIC production for S-band and EW-band applications. In: 2013 international conference on compound semiconductor manufacturing technology CS MANTECH 2013, pp 95–98 Fury R, Sheppard ST, Barner JB, Pribble B, Fisher J, Gajewski DA, Radulescu F, Hagleitner H, Namishia D, Ring Z, Gao J, Lee S, Fetzer B, Mcfarland R, Milligan J, Palmour J (2013) GaN-on-SiC MMIC production for S-band and EW-band applications. In: 2013 international conference on compound semiconductor manufacturing technology CS MANTECH 2013, pp 95–98
18.
go back to reference Smolko J, Whelan CS, Macdonald C, Krause J, Mikesell B, Benedek M (2013) Raytheon title III gallium nitride (GaN) production program. In: 2013 International conference on compound semiconductor manufacturing technology CS MANTECH 2013, pp 87–90 Smolko J, Whelan CS, Macdonald C, Krause J, Mikesell B, Benedek M (2013) Raytheon title III gallium nitride (GaN) production program. In: 2013 International conference on compound semiconductor manufacturing technology CS MANTECH 2013, pp 87–90
21.
go back to reference Cree earns US DoD MRL8 Designation After Completing Title III GaN-on-SiC Production Capacity Program (2014) Semiconductor today Cree earns US DoD MRL8 Designation After Completing Title III GaN-on-SiC Production Capacity Program (2014) Semiconductor today
25.
go back to reference Ridley BK, Schaff WJ, Eastman LF (2004) Hot-phonon-induced velocity saturation in GaN. J Appl Phys 96(3):1499–1502CrossRef Ridley BK, Schaff WJ, Eastman LF (2004) Hot-phonon-induced velocity saturation in GaN. J Appl Phys 96(3):1499–1502CrossRef
26.
go back to reference Matulionis A (2006) Feature article: hot phonons in GaN channels for HEMTs. Phys Status Solidi Appl Mater Sci 203(10):2313–2325CrossRef Matulionis A (2006) Feature article: hot phonons in GaN channels for HEMTs. Phys Status Solidi Appl Mater Sci 203(10):2313–2325CrossRef
27.
go back to reference Khurgin J, Ding YJ, Jena D (2007) Hot phonon effect on electron velocity saturation in GaN: a second look. Appl Phys Lett 91(25):2–4CrossRef Khurgin J, Ding YJ, Jena D (2007) Hot phonon effect on electron velocity saturation in GaN: a second look. Appl Phys Lett 91(25):2–4CrossRef
28.
go back to reference Palacios T, Chakraborty A, Rajan S, Poblenz C, Keller S, DenBaars SP, Speck JS, Mishra UK (2005) High-power AlGaN/GaN HEMTs for Ka-band applications. IEEE Electron Device Lett 26(11):781–783CrossRef Palacios T, Chakraborty A, Rajan S, Poblenz C, Keller S, DenBaars SP, Speck JS, Mishra UK (2005) High-power AlGaN/GaN HEMTs for Ka-band applications. IEEE Electron Device Lett 26(11):781–783CrossRef
29.
go back to reference Moon JS, Wu S, Wong D, Milosavljevic I, Conway A, Hashimoto P, Hu M, Antcliffe M, Micovic M (2005) Gate-recessed AlGaN-GaN HEMTs for high-performance millimeter-wave applications. IEEE Electron Device Lett 26(6):348–350 Moon JS, Wu S, Wong D, Milosavljevic I, Conway A, Hashimoto P, Hu M, Antcliffe M, Micovic M (2005) Gate-recessed AlGaN-GaN HEMTs for high-performance millimeter-wave applications. IEEE Electron Device Lett 26(6):348–350
30.
go back to reference Wu Y-F, Moore M, Saxler A, Wisleder T, Mishra UK, Parikh P (2005) 8-watt GaN HEMTs at millimeter-wave frequencies. In: IEEE international electron devices meeting. IEDM technical digest, vol 00, no c, pp 583–585 Wu Y-F, Moore M, Saxler A, Wisleder T, Mishra UK, Parikh P (2005) 8-watt GaN HEMTs at millimeter-wave frequencies. In: IEEE international electron devices meeting. IEDM technical digest, vol 00, no c, pp 583–585
31.
go back to reference Smith PM, Dugas D, Chu K, Nichols K, Duh KG, Fisher J, Xu D, Gunter L, Vera A, Lender R, Meharry D (2003) Progress in GaAs metamorphic HEMT technology for microwave applications. In: 25th annual technical digest 2003. IEEE Gallium Arsenide integrated circuit (GaAs IC) symposium, pp 21–24 Smith PM, Dugas D, Chu K, Nichols K, Duh KG, Fisher J, Xu D, Gunter L, Vera A, Lender R, Meharry D (2003) Progress in GaAs metamorphic HEMT technology for microwave applications. In: 25th annual technical digest 2003. IEEE Gallium Arsenide integrated circuit (GaAs IC) symposium, pp 21–24
32.
go back to reference Chen S, Nayak S, Kao M-Y, Delaney J (2004) A Ka/Q-band 2 Watt MMIC power amplifier using dual recess 0.15 μm PHEMT process. In: 2004 IEEE MTT-S international microwave symposium digest (IEEE Cat. No. 04CH37535), pp 1669–1672 Chen S, Nayak S, Kao M-Y, Delaney J (2004) A Ka/Q-band 2 Watt MMIC power amplifier using dual recess 0.15 μm PHEMT process. In: 2004 IEEE MTT-S international microwave symposium digest (IEEE Cat. No. 04CH37535), pp 1669–1672
33.
go back to reference Federal Communications Commission (2003) In the matter of allocations and service rules for the 71-76 GHz, 81-86 GHz and 92-95 GHz Bands: Loea communications corporation petition for rulemaking. FCC 03-248, 4 Nov 2003 Federal Communications Commission (2003) In the matter of allocations and service rules for the 71-76 GHz, 81-86 GHz and 92-95 GHz Bands: Loea communications corporation petition for rulemaking. FCC 03-248, 4 Nov 2003
34.
go back to reference Micovic M, Kurdoghlian A, Hashimoto P, Hu M, Antcliffe M, Willadsen PJ, Wong WS, Bowen R, Milosavljevic I, Schmitz A, Wetzel M, Chow DH (2006) GaN HFET for W-band power applications. In: International electron devices meeting, pp 1–3 Micovic M, Kurdoghlian A, Hashimoto P, Hu M, Antcliffe M, Willadsen PJ, Wong WS, Bowen R, Milosavljevic I, Schmitz A, Wetzel M, Chow DH (2006) GaN HFET for W-band power applications. In: International electron devices meeting, pp 1–3
35.
go back to reference Shinohara K, Regan DC, Tang Y, Corrion AL, Brown DF, Wong JC, Robinson JF, Fung HH, Schmitz A, Oh TC, Kim SJ, Chen PS, Nagele RG, Margomenos AD, Micovic M (2013) Scaling of GaN HEMTs and schottky diodes for submillimeter-wave MMIC applications. IEEE Trans Electron Devices 60(10):2982–2996CrossRef Shinohara K, Regan DC, Tang Y, Corrion AL, Brown DF, Wong JC, Robinson JF, Fung HH, Schmitz A, Oh TC, Kim SJ, Chen PS, Nagele RG, Margomenos AD, Micovic M (2013) Scaling of GaN HEMTs and schottky diodes for submillimeter-wave MMIC applications. IEEE Trans Electron Devices 60(10):2982–2996CrossRef
36.
go back to reference Margomenos A, Kurdoghlian A, Micovic M, Shinohara K, Brown DF, Corrion AL, Moyer HP, Burnham S, Regan DC, Grabar RM, McGuire C, Wetzel MD, Bowen R, Chen PS, Tai HY, Schmitz A, Fung H, Fung A, Chow DH (2014) GaN technology for E, W and G-band applications. In: 2014 IEEE compound semiconductor integrated circuit symposium (CSICS), pp 1–4 Margomenos A, Kurdoghlian A, Micovic M, Shinohara K, Brown DF, Corrion AL, Moyer HP, Burnham S, Regan DC, Grabar RM, McGuire C, Wetzel MD, Bowen R, Chen PS, Tai HY, Schmitz A, Fung H, Fung A, Chow DH (2014) GaN technology for E, W and G-band applications. In: 2014 IEEE compound semiconductor integrated circuit symposium (CSICS), pp 1–4
37.
go back to reference Schellenberg JM (2015) A 2-W W-band GaN traveling-wave amplifier with 25-GHz bandwidth. IEEE Trans Microw Theory Tech 63(9):2833–2840CrossRef Schellenberg JM (2015) A 2-W W-band GaN traveling-wave amplifier with 25-GHz bandwidth. IEEE Trans Microw Theory Tech 63(9):2833–2840CrossRef
38.
go back to reference Camargo E, Schellenberg J, Bui L, Estella N (2014) Power GaAs MMICs for E-band communications applications. In: 2014 IEEE MTT-S international microwave symposium (IMS2014), pp 1–4 Camargo E, Schellenberg J, Bui L, Estella N (2014) Power GaAs MMICs for E-band communications applications. In: 2014 IEEE MTT-S international microwave symposium (IMS2014), pp 1–4
39.
go back to reference Makiyama K, Ozaki S, Ohki T, Okamoto N, Minoura Y, Niida Y, Kamada Y, Joshin K, Watanabe K, Miyamoto Y (2015) Collapse-free high power InAlGaN/GaN-HEMT with 3 W/mm at 96 GHz. In: 2015 IEEE international electron devices meeting, pp 213–216. Makiyama K, Ozaki S, Ohki T, Okamoto N, Minoura Y, Niida Y, Kamada Y, Joshin K, Watanabe K, Miyamoto Y (2015) Collapse-free high power InAlGaN/GaN-HEMT with 3 W/mm at 96 GHz. In: 2015 IEEE international electron devices meeting, pp 213–216.
40.
go back to reference Yu ET, Sullivan GJ, Asbeck PM, Wang CD, Qiao D, Lau SS (1997) Measurement of piezoelectrically induced charge in GaN/AlGaN heterostructure field-effect transistors. Appl Phys Lett 71(19):2794CrossRef Yu ET, Sullivan GJ, Asbeck PM, Wang CD, Qiao D, Lau SS (1997) Measurement of piezoelectrically induced charge in GaN/AlGaN heterostructure field-effect transistors. Appl Phys Lett 71(19):2794CrossRef
41.
go back to reference Bykhovski AD, Gaska R, Shur MS (1998) Piezoelectric doping and elastic strain relaxation in AlGaN-GaN heterostructure field effect transistors. Appl Phys Lett 73(24):3577–3579CrossRef Bykhovski AD, Gaska R, Shur MS (1998) Piezoelectric doping and elastic strain relaxation in AlGaN-GaN heterostructure field effect transistors. Appl Phys Lett 73(24):3577–3579CrossRef
42.
go back to reference Smorchkova I, Elsass C, Ibbetson J, Vetury R, Heying B, Fini P, Haus E, DenBaars S, Speck J, Mishra U (1999) Polarization-induced charge and electron mobility in AlGaN/GaN heterostructures grown by plasma-assisted molecular-beam epitaxy. J Appl Phys 86(8):4520–4526CrossRef Smorchkova I, Elsass C, Ibbetson J, Vetury R, Heying B, Fini P, Haus E, DenBaars S, Speck J, Mishra U (1999) Polarization-induced charge and electron mobility in AlGaN/GaN heterostructures grown by plasma-assisted molecular-beam epitaxy. J Appl Phys 86(8):4520–4526CrossRef
43.
go back to reference Keller S, Li H, Laurent M, Hu Y, Pfaff N, Lu J, Brown DF, Fichtenbaum NA, Speck JS, Denbaars SP, Mishra UK (2014) Recent progress in metal-organic chemical vapor deposition of (000-1) N-polar group-III nitrides. Semicond Sci Technol 29:113001 Keller S, Li H, Laurent M, Hu Y, Pfaff N, Lu J, Brown DF, Fichtenbaum NA, Speck JS, Denbaars SP, Mishra UK (2014) Recent progress in metal-organic chemical vapor deposition of (000-1) N-polar group-III nitrides. Semicond Sci Technol 29:113001
44.
go back to reference Wong MH, Keller S, Dasgupta NS, Denninghoff DJ, Kolluri S, Brown DF, Lu J, Fichtenbaum NA, Ahmadi E, Singisetti U, Chini A, Rajan S, DenBaars SP, Speck JS, Mishra UK (2013) N-polar GaN epitaxy and high electron mobility transistors. Semicond Sci Technol 28(7):074009 Wong MH, Keller S, Dasgupta NS, Denninghoff DJ, Kolluri S, Brown DF, Lu J, Fichtenbaum NA, Ahmadi E, Singisetti U, Chini A, Rajan S, DenBaars SP, Speck JS, Mishra UK (2013) N-polar GaN epitaxy and high electron mobility transistors. Semicond Sci Technol 28(7):074009
45.
go back to reference Murphy MJ, Chu K, Wu H, Yeo W, Schaff WJ, Ambacher O, Smart J, Shealy JR, Eastman LF, Eustis TJ (1999) Molecular beam epitaxial growth of normal and inverted two-dimensional electron gases in AlGaN/GaN based heterostructures. J Vac Sci Technol B Microelectron Nanometer Struct 17(3):1252–1254 Murphy MJ, Chu K, Wu H, Yeo W, Schaff WJ, Ambacher O, Smart J, Shealy JR, Eastman LF, Eustis TJ (1999) Molecular beam epitaxial growth of normal and inverted two-dimensional electron gases in AlGaN/GaN based heterostructures. J Vac Sci Technol B Microelectron Nanometer Struct 17(3):1252–1254
46.
go back to reference Dimitrov R, Murphy M, Smart J, Schaff W, Shealy JR, Eastman LF, Ambacher O, Stutzmann M (2000) Two-dimensional electron gases in Ga-face and N-face AlGaN/GaN heterostructures grown by plasma-induced molecular beam epitaxy and metalorganic chemical vapor deposition on sapphire. J Appl Phys 87(7):3375CrossRef Dimitrov R, Murphy M, Smart J, Schaff W, Shealy JR, Eastman LF, Ambacher O, Stutzmann M (2000) Two-dimensional electron gases in Ga-face and N-face AlGaN/GaN heterostructures grown by plasma-induced molecular beam epitaxy and metalorganic chemical vapor deposition on sapphire. J Appl Phys 87(7):3375CrossRef
47.
go back to reference Hellman ES (1998) The polarity of GaN: a Critical Review. MRS Internet J Nitride Semicond Res 3(1998):e11CrossRef Hellman ES (1998) The polarity of GaN: a Critical Review. MRS Internet J Nitride Semicond Res 3(1998):e11CrossRef
48.
go back to reference Sasaki T, Matsuoka T (1988) Substrate-polarity dependence of metal-organic vapor-phase epitaxy-grown GaN on SiC. J Appl Phys 64(9):4531–4535CrossRef Sasaki T, Matsuoka T (1988) Substrate-polarity dependence of metal-organic vapor-phase epitaxy-grown GaN on SiC. J Appl Phys 64(9):4531–4535CrossRef
49.
go back to reference Rajan S, Chini A, Wong MH, Speck JS, Mishra UK (2007) N-polar GaNAlGaNGaN high electron mobility transistors. J Appl Phys 102(4):044501 Rajan S, Chini A, Wong MH, Speck JS, Mishra UK (2007) N-polar GaNAlGaNGaN high electron mobility transistors. J Appl Phys 102(4):044501
50.
go back to reference Ambacher O, Smart J, Shealy JR, Weimann NG, Chu K, Murphy M, Schaff WJ, Eastman LF, Dimitrov R, Wittmer L, Stutzmann M, Rieger W, Hilsenbeck J (1999) Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures. J Appl Phys 85(6):3222CrossRef Ambacher O, Smart J, Shealy JR, Weimann NG, Chu K, Murphy M, Schaff WJ, Eastman LF, Dimitrov R, Wittmer L, Stutzmann M, Rieger W, Hilsenbeck J (1999) Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures. J Appl Phys 85(6):3222CrossRef
51.
go back to reference Ambacher O, Foutz B, Smart J, Shealy JR, Weimann NG, Chu K, Murphy M, Sierakowski AJ, Schaff WJ, Eastman LF, Dimitrov R, Mitchell A, Stutzmann M (2000) Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures. J Appl Phys 87(1):334CrossRef Ambacher O, Foutz B, Smart J, Shealy JR, Weimann NG, Chu K, Murphy M, Sierakowski AJ, Schaff WJ, Eastman LF, Dimitrov R, Mitchell A, Stutzmann M (2000) Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures. J Appl Phys 87(1):334CrossRef
52.
go back to reference Morkoç H, Di Carlo A, Cingolani R (2002) GaN-based modulation doped FETs and UV detectors. Solid State Electron 46(2):157–202CrossRef Morkoç H, Di Carlo A, Cingolani R (2002) GaN-based modulation doped FETs and UV detectors. Solid State Electron 46(2):157–202CrossRef
53.
go back to reference Kusakabe K, Kishino K, Kikuchi A, Yamada T, Sugihara D, Nakamura S (2001) Reduction of threading dislocations in migration enhanced epitaxy grown GaN with N-polarity by use of AlN multiple interlayer. J Cryst Growth 230(3–4):387–391CrossRef Kusakabe K, Kishino K, Kikuchi A, Yamada T, Sugihara D, Nakamura S (2001) Reduction of threading dislocations in migration enhanced epitaxy grown GaN with N-polarity by use of AlN multiple interlayer. J Cryst Growth 230(3–4):387–391CrossRef
54.
go back to reference Monroy E, Sarigiannidou E, Fossard F, Gogneau N, Bellet-Amalric E, Rouvire JL, Monnoye S, Mank H, Daudin B (2004) Growth kinetics of N-face polarity GaN by plasma-assisted molecular-beam epitaxy. Appl Phys Lett 84(18):3684–3686CrossRef Monroy E, Sarigiannidou E, Fossard F, Gogneau N, Bellet-Amalric E, Rouvire JL, Monnoye S, Mank H, Daudin B (2004) Growth kinetics of N-face polarity GaN by plasma-assisted molecular-beam epitaxy. Appl Phys Lett 84(18):3684–3686CrossRef
55.
go back to reference Zauner ARA, Weyher JL, Plomp M, Kirilyuk V, Grzegory I, Van Enckevort WJP, Schermer JJ, Hageman PR, Larsen PK (2000) Homo-epitaxial GaN growth on exact and misoriented single crystals: suppression of hillock formation. J Cryst Growth 210(4):435–443CrossRef Zauner ARA, Weyher JL, Plomp M, Kirilyuk V, Grzegory I, Van Enckevort WJP, Schermer JJ, Hageman PR, Larsen PK (2000) Homo-epitaxial GaN growth on exact and misoriented single crystals: suppression of hillock formation. J Cryst Growth 210(4):435–443CrossRef
56.
go back to reference Zauner ARA, Aret E, Van Enckevort WJP, Weyher JL, Porowski S, Schermer JJ (2002) Homo-epitaxial growth on the N-face of GaN single crystals: the influence of the misorientation on the surface morphology. J Cryst Growth 240(1–2):14–21CrossRef Zauner ARA, Aret E, Van Enckevort WJP, Weyher JL, Porowski S, Schermer JJ (2002) Homo-epitaxial growth on the N-face of GaN single crystals: the influence of the misorientation on the surface morphology. J Cryst Growth 240(1–2):14–21CrossRef
57.
go back to reference Rajan S, Wong M, Fu Y, Wu F, Speck JS, Mishra UK (2005) Growth and electrical characterization of N-face AlGaN/GaN heterostructures. Japan J Appl Phys Lett 44, no 46–49 Rajan S, Wong M, Fu Y, Wu F, Speck JS, Mishra UK (2005) Growth and electrical characterization of N-face AlGaN/GaN heterostructures. Japan J Appl Phys Lett 44, no 46–49
58.
go back to reference Keller S, Fichtenbaum NA, Wu F, Brown D, Rosales A, Denbaars SP, Speck JS, Mishra UK (2007) Influence of the substrate misorientation on the properties of N-polar GaN films grown by metal organic chemical vapor deposition. J Appl Phys 102(8):0–6 Keller S, Fichtenbaum NA, Wu F, Brown D, Rosales A, Denbaars SP, Speck JS, Mishra UK (2007) Influence of the substrate misorientation on the properties of N-polar GaN films grown by metal organic chemical vapor deposition. J Appl Phys 102(8):0–6
59.
go back to reference Brown DF, Keller S, Wu F, Speck JS, DenBaars SP, Mishra UK (2008) Growth and characterization of N-polar GaN films on SiC by metal organic chemical vapor deposition. J Appl Phys 104(2):024301CrossRef Brown DF, Keller S, Wu F, Speck JS, DenBaars SP, Mishra UK (2008) Growth and characterization of N-polar GaN films on SiC by metal organic chemical vapor deposition. J Appl Phys 104(2):024301CrossRef
60.
go back to reference Ahmadi E, Wu F, Li H, Kaun SW, Tahhan M, Hestroffer K, Keller S, Speck JS, Mishra UK (2015) N-face GaN/AlN/GaN/InAlN and GaN/AlN/AlGaN/GaN/InAlN high-electron-mobility transistor structures grown by plasma-assisted molecular beam epitaxy on vicinal substrates. Semicond Sci Technol 30(5):055012CrossRef Ahmadi E, Wu F, Li H, Kaun SW, Tahhan M, Hestroffer K, Keller S, Speck JS, Mishra UK (2015) N-face GaN/AlN/GaN/InAlN and GaN/AlN/AlGaN/GaN/InAlN high-electron-mobility transistor structures grown by plasma-assisted molecular beam epitaxy on vicinal substrates. Semicond Sci Technol 30(5):055012CrossRef
61.
go back to reference Wienecke S, Romanczyk B, Guidry M, Li H, Zheng X, Ahmadi E, Hestroffer K, Keller S, Mishra U (2015) N-polar deep recess HEMTs for W-band power applications. In: Presented at 42nd international symposium on compound semiconductors Wienecke S, Romanczyk B, Guidry M, Li H, Zheng X, Ahmadi E, Hestroffer K, Keller S, Mishra U (2015) N-polar deep recess HEMTs for W-band power applications. In: Presented at 42nd international symposium on compound semiconductors
62.
go back to reference Chini A, Fu Y, Rajan S, Speck J, Mishra UK (2005) An experimental method to identify bulk and surface traps in GaN HEMTs. In: 32nd international symposium on compound semiconductors (ISCS), vol 1, pp 1–2 Chini A, Fu Y, Rajan S, Speck J, Mishra UK (2005) An experimental method to identify bulk and surface traps in GaN HEMTs. In: 32nd international symposium on compound semiconductors (ISCS), vol 1, pp 1–2
63.
go back to reference Wienecke S, Guidry M, Li H, Ahmadi E, Hestroffer K, Zheng X, Keller S, Mishra UK (2014) Optimization of back-barrier doping in graded AlGaN N-face MISHEMTs. In: (poster) 2014 IEEE lester eastman conference, New York, 5–7 Aug 2014 Wienecke S, Guidry M, Li H, Ahmadi E, Hestroffer K, Zheng X, Keller S, Mishra UK (2014) Optimization of back-barrier doping in graded AlGaN N-face MISHEMTs. In: (poster) 2014 IEEE lester eastman conference, New York, 5–7 Aug 2014
64.
go back to reference Grundman M (2007) Polarization-induced tunnel junctions in III-nitrides for optoelectronic applications. PhD Thesis, University of California Grundman M (2007) Polarization-induced tunnel junctions in III-nitrides for optoelectronic applications. PhD Thesis, University of California
65.
go back to reference Wong MH, Singisetti U, Lu J, Speck JS, Mishra UK (2011) Anomalous output conductance in N-polar GaN-based MIS-HEMTs. In: 69th device research conference, pp 211–212 Wong MH, Singisetti U, Lu J, Speck JS, Mishra UK (2011) Anomalous output conductance in N-polar GaN-based MIS-HEMTs. In: 69th device research conference, pp 211–212
66.
go back to reference Schaake CA, Brown DF, Swenson BL, Keller S, Speck JS, Mishra UK (2013) A donor-like trap at the InGaN/GaN interface with net negative polarization and its possible consequence on internal quantum efficiency. Semicond Sci Technol 28(10):105021CrossRef Schaake CA, Brown DF, Swenson BL, Keller S, Speck JS, Mishra UK (2013) A donor-like trap at the InGaN/GaN interface with net negative polarization and its possible consequence on internal quantum efficiency. Semicond Sci Technol 28(10):105021CrossRef
67.
go back to reference Wong MH, Pei Y, Brown DF, Keller S, Speck JS, Mishra UK (2009) High-performance N-face GaN microwave MIS-HEMTs with >70 % power-added efficiency. IEEE Electron Device Lett 30(8):802–804CrossRef Wong MH, Pei Y, Brown DF, Keller S, Speck JS, Mishra UK (2009) High-performance N-face GaN microwave MIS-HEMTs with >70 % power-added efficiency. IEEE Electron Device Lett 30(8):802–804CrossRef
68.
go back to reference Wong MH, Brown DF, Schuette ML, Kim H, Balasubramanian V, Lu W, Speck JS, Mishra UK (2011) X-band power performance of N-face GaN MIS-HEMTs. Electron Lett 47(3):214CrossRef Wong MH, Brown DF, Schuette ML, Kim H, Balasubramanian V, Lu W, Speck JS, Mishra UK (2011) X-band power performance of N-face GaN MIS-HEMTs. Electron Lett 47(3):214CrossRef
69.
go back to reference Kolluri S, Member S, Keller S, Denbaars SP, Mishra UK (2012) Microwave Power Performance N-Polar GaN MISHEMTs Grown by MOCVD on SiC Substrates Using an Al2O3 etch-stop technology. IEEE Electron Device Lett 33(1):44–46CrossRef Kolluri S, Member S, Keller S, Denbaars SP, Mishra UK (2012) Microwave Power Performance N-Polar GaN MISHEMTs Grown by MOCVD on SiC Substrates Using an Al2O3 etch-stop technology. IEEE Electron Device Lett 33(1):44–46CrossRef
70.
go back to reference Pei Y, Chu R, Fichtenbaum NA, Chen Z, Brown D, Shen L, Keller S, DenBaars SP, Mishra UK (2007) Recessed slant gate AlGaN/GaN high electron mobility transistors with 20.9 W/mm at 10 GHz. Jpn J Appl Phys 46(45):L1087–L1089 Pei Y, Chu R, Fichtenbaum NA, Chen Z, Brown D, Shen L, Keller S, DenBaars SP, Mishra UK (2007) Recessed slant gate AlGaN/GaN high electron mobility transistors with 20.9 W/mm at 10 GHz. Jpn J Appl Phys 46(45):L1087–L1089
71.
go back to reference Guerra D, Akis R, Ferry DK, Goodnick SM, Saraniti M, Marino FA (2010) Cellular Monte Carlo study of RF short-channel effects, effective gate length, and aspect ratio in GaN and InGaAs HEMTs. In: 2010 14th international workshop computational electronics, IWCE 2010, vol 1, pp 105–108 Guerra D, Akis R, Ferry DK, Goodnick SM, Saraniti M, Marino FA (2010) Cellular Monte Carlo study of RF short-channel effects, effective gate length, and aspect ratio in GaN and InGaAs HEMTs. In: 2010 14th international workshop computational electronics, IWCE 2010, vol 1, pp 105–108
72.
go back to reference Guerra D, Saraniti M, Faralli N, Ferry DK, Goodnick SM, Marino FA (2010) Comparison of N- and Ga-face GaN HEMTs through cellular Monte Carlo simulations. IEEE Trans Electron Devices 57(12):3348–3354CrossRef Guerra D, Saraniti M, Faralli N, Ferry DK, Goodnick SM, Marino FA (2010) Comparison of N- and Ga-face GaN HEMTs through cellular Monte Carlo simulations. IEEE Trans Electron Devices 57(12):3348–3354CrossRef
73.
go back to reference Park PS, Rajan S (2011) Simulation of Short-Channel Effects in N- and Ga-Polar AlGaN/GaN HEMTs. IEEE Trans Electron Devices 58(3):704–708CrossRef Park PS, Rajan S (2011) Simulation of Short-Channel Effects in N- and Ga-Polar AlGaN/GaN HEMTs. IEEE Trans Electron Devices 58(3):704–708CrossRef
74.
go back to reference Denninghoff D, Lu J, Ahmadi E, Keller S, Mishra U (2012) N-polar GaN/InAlN/AlGaN MIS-HEMTs with highly scaled GaN channels. In: International symposium on compound semiconductors (ISCS) Denninghoff D, Lu J, Ahmadi E, Keller S, Mishra U (2012) N-polar GaN/InAlN/AlGaN MIS-HEMTs with highly scaled GaN channels. In: International symposium on compound semiconductors (ISCS)
75.
go back to reference Dasgupta NS, Brown DF, Keller S, Speck JS, Mishra UK (2009) N-polar GaN-based highly scaled self-aligned MIS-HEMTs with state-of-the-art fT-LG product of 16.8 GHz-μm. In: 2009 IEEE international electron devices meeting (IEDM), vol 805, pp 1–3 Dasgupta NS, Brown DF, Keller S, Speck JS, Mishra UK (2009) N-polar GaN-based highly scaled self-aligned MIS-HEMTs with state-of-the-art fT-LG product of 16.8 GHz-μm. In: 2009 IEEE international electron devices meeting (IEDM), vol 805, pp 1–3
76.
go back to reference Dasgupta NS, Brown DF, Wu F, Keller S, Speck JS, Mishra UK (2010) Ultralow nonalloyed Ohmic contact resistance to self aligned N-polar GaN high electron mobility transistors by In(Ga)N regrowth. Appl Phys Lett 96(14):3–6 Dasgupta NS, Brown DF, Wu F, Keller S, Speck JS, Mishra UK (2010) Ultralow nonalloyed Ohmic contact resistance to self aligned N-polar GaN high electron mobility transistors by In(Ga)N regrowth. Appl Phys Lett 96(14):3–6
77.
go back to reference Singisetti U, Hoi Wong M, Mishra UK (2012) Interface roughness scattering in ultra-thin N-polar GaN quantum well channels. Appl Phys Lett 101(1):1–5 Singisetti U, Hoi Wong M, Mishra UK (2012) Interface roughness scattering in ultra-thin N-polar GaN quantum well channels. Appl Phys Lett 101(1):1–5
78.
go back to reference Carlin JF, Ilegems M (2003) High-quality AllnN for high index contrast Bragg mirrors lattice matched to GaN. Appl Phys Lett 83(4):668–670CrossRef Carlin JF, Ilegems M (2003) High-quality AllnN for high index contrast Bragg mirrors lattice matched to GaN. Appl Phys Lett 83(4):668–670CrossRef
79.
go back to reference Lorenz K, Franco N, Alves E, Watson IM, Martin RW, O’Donnell KP (2006) Anomalous ion channeling in AlInN/GaN bilayers: determination of the strain state. Phys Rev Lett 97(8):1–4CrossRef Lorenz K, Franco N, Alves E, Watson IM, Martin RW, O’Donnell KP (2006) Anomalous ion channeling in AlInN/GaN bilayers: determination of the strain state. Phys Rev Lett 97(8):1–4CrossRef
80.
go back to reference Kuzmik J (2001) Power electronics on InAlN/(In)GaN: prospect for a record performance. IEEE Electron Device Lett 22(11):510–512CrossRef Kuzmik J (2001) Power electronics on InAlN/(In)GaN: prospect for a record performance. IEEE Electron Device Lett 22(11):510–512CrossRef
81.
go back to reference Brown DF, Keller S, Mates TE, Speck JS, Denbaars SP, Mishra UK (2010) Growth and characterization of In-polar and N-polar InAlN by metal organic chemical vapor deposition. J Appl Phys 107(3):1–8CrossRef Brown DF, Keller S, Mates TE, Speck JS, Denbaars SP, Mishra UK (2010) Growth and characterization of In-polar and N-polar InAlN by metal organic chemical vapor deposition. J Appl Phys 107(3):1–8CrossRef
82.
go back to reference Brown DF, Nidhi SR, Wu F, Keller S, DenBaars SP, Mishra UK (2010) N-Polar InAlN/AlN/GaN MIS-HEMTs. IEEE Electron Device Lett 31(8):800–802 Brown DF, Nidhi SR, Wu F, Keller S, DenBaars SP, Mishra UK (2010) N-Polar InAlN/AlN/GaN MIS-HEMTs. IEEE Electron Device Lett 31(8):800–802
83.
go back to reference Dasgupta S, Choi S, Wu F, Speck JS, Mishra UK (2011) Growth, structural, and electrical characterizations of N-polar InAlN by plasma-assisted molecular beam epitaxy. Appl Phys Express 4(4):045502CrossRef Dasgupta S, Choi S, Wu F, Speck JS, Mishra UK (2011) Growth, structural, and electrical characterizations of N-polar InAlN by plasma-assisted molecular beam epitaxy. Appl Phys Express 4(4):045502CrossRef
84.
go back to reference Dasgupta NS, Lu J, Speck JS, Mishra UK (2012) Self-Aligned N-polar GaN/InAlN MIS-HEMTs with record extrinsic transconductance of 1105 mS/mm. IEEE Electron Device Lett 33(6):794–796 Dasgupta NS, Lu J, Speck JS, Mishra UK (2012) Self-Aligned N-polar GaN/InAlN MIS-HEMTs with record extrinsic transconductance of 1105 mS/mm. IEEE Electron Device Lett 33(6):794–796
85.
go back to reference Ahmadi E, Shivaraman R, Wu F, Wienecke S, Kaun SW, Keller S, Speck JS, Mishra UK (2014) Elimination of columnar microstructure in N-face InAlN, lattice-matched to GaN, grown by plasma-assisted molecular beam epitaxy in the N-rich regime. Appl Phys Lett 104(7):2014–2017CrossRef Ahmadi E, Shivaraman R, Wu F, Wienecke S, Kaun SW, Keller S, Speck JS, Mishra UK (2014) Elimination of columnar microstructure in N-face InAlN, lattice-matched to GaN, grown by plasma-assisted molecular beam epitaxy in the N-rich regime. Appl Phys Lett 104(7):2014–2017CrossRef
86.
go back to reference Lu J, Denninghoff D, Yeluri R, Lal S, Gupta G, Laurent M, Keller S, Denbaars SP, Mishra UK (2013) Very high channel conductivity in ultra-thin channel N-polar GaN/(AlN, InAlN, AlGaN) high electron mobility hetero-junctions grown by metalorganic chemical vapor deposition. Appl Phys Lett 102(23):16–21 Lu J, Denninghoff D, Yeluri R, Lal S, Gupta G, Laurent M, Keller S, Denbaars SP, Mishra UK (2013) Very high channel conductivity in ultra-thin channel N-polar GaN/(AlN, InAlN, AlGaN) high electron mobility hetero-junctions grown by metalorganic chemical vapor deposition. Appl Phys Lett 102(23):16–21
87.
go back to reference Lu J, Zheng X, Guidry M, Denninghoff D, Ahmadi E, Lal S, Keller S, Denbaars SP, Mishra UK (2014) Engineering the (In, Al, Ga)N back-barrier to achieve high channel-conductivity for extremely scaled channel-thicknesses in N-polar GaN high-electron-mobility-transistors. Appl Phys Lett 104(9):092107 Lu J, Zheng X, Guidry M, Denninghoff D, Ahmadi E, Lal S, Keller S, Denbaars SP, Mishra UK (2014) Engineering the (In, Al, Ga)N back-barrier to achieve high channel-conductivity for extremely scaled channel-thicknesses in N-polar GaN high-electron-mobility-transistors. Appl Phys Lett 104(9):092107
88.
go back to reference Denninghoff D, Lu J, Ahmadi E, Keller S, Mishra UK (2013) N-polar GaN/InAlN/AlGaN MIS-HEMTs with 1.89 S/mm extrinsic transconductance, 4 A/mm drain current, 204 GHz f T and 405 GHz f max, vol 33, no 7 Denninghoff D, Lu J, Ahmadi E, Keller S, Mishra UK (2013) N-polar GaN/InAlN/AlGaN MIS-HEMTs with 1.89 S/mm extrinsic transconductance, 4 A/mm drain current, 204 GHz f T and 405 GHz f max, vol 33, no 7
89.
go back to reference Laurent MA, Gupta G, Suntrup DJ, DenBaars SP, Mishra UK (2016) Barrier height inhomogeneity and its impact on (Al, In, Ga)N Schottky diodes. J Appl Phys 119(6):064501CrossRef Laurent MA, Gupta G, Suntrup DJ, DenBaars SP, Mishra UK (2016) Barrier height inhomogeneity and its impact on (Al, In, Ga)N Schottky diodes. J Appl Phys 119(6):064501CrossRef
90.
go back to reference Shen L, Coffie R, Buttari D, Heikman S, Chakraborty A, Chini A, Keller S, DenBaars SP, Mishra UK (2004) High-power polarization-engineered GaN/AlGaN/GaN HEMTs without surface passivation. IEEE Electron Device Lett 25(1):7–9CrossRef Shen L, Coffie R, Buttari D, Heikman S, Chakraborty A, Chini A, Keller S, DenBaars SP, Mishra UK (2004) High-power polarization-engineered GaN/AlGaN/GaN HEMTs without surface passivation. IEEE Electron Device Lett 25(1):7–9CrossRef
91.
go back to reference Shen L, Pei Y, McCarthy L, Poblenz C, Corrion A, Fichtenbaum N, Keller S, Denbaars SP, Speck JS, Mishra UK (2007) Deep-recessed GaN HEMTs using selective etch technology exhibiting high microwave performance without surface passivation. IEEE MTT-S international microwave symposium digest, pp 623–626 Shen L, Pei Y, McCarthy L, Poblenz C, Corrion A, Fichtenbaum N, Keller S, Denbaars SP, Speck JS, Mishra UK (2007) Deep-recessed GaN HEMTs using selective etch technology exhibiting high microwave performance without surface passivation. IEEE MTT-S international microwave symposium digest, pp 623–626
92.
go back to reference Shen L, Palacios T, Poblenz C, Corrion A, Chakraborty A, Fichtenbaum N, Keller S, Denbaars SP, Speck JS, Mishra UK (2006) Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment. IEEE Electron Device Lett 27(4):214–216CrossRef Shen L, Palacios T, Poblenz C, Corrion A, Chakraborty A, Fichtenbaum N, Keller S, Denbaars SP, Speck JS, Mishra UK (2006) Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment. IEEE Electron Device Lett 27(4):214–216CrossRef
93.
go back to reference Chu R, Shen L, Fichtenbaum N, Brown D, Chen Z, Keller S, DenBaars SP, Mishra UK (2008) V-Gate GaN HEMTs for X-Band power applications. IEEE Electron Device Lett 29(9):974–976CrossRef Chu R, Shen L, Fichtenbaum N, Brown D, Chen Z, Keller S, DenBaars SP, Mishra UK (2008) V-Gate GaN HEMTs for X-Band power applications. IEEE Electron Device Lett 29(9):974–976CrossRef
94.
go back to reference Dasgupta NS, Keller S, Speck JS, Mishra UK (2011) N-polar GaN/AlN MIS-HEMT with fMAX of 204 GHz for Ka-Band applications. IEEE Electron Device Lett 32(12):1683–1685 Dasgupta NS, Keller S, Speck JS, Mishra UK (2011) N-polar GaN/AlN MIS-HEMT with fMAX of 204 GHz for Ka-Band applications. IEEE Electron Device Lett 32(12):1683–1685
95.
go back to reference Kolluri S, Brown DF, Wong MH, Dasgupta S, Keller S, Denbaars SP, Mishra UK (2011) RF performance of deep-recessed N-polar GaN MIS-HEMTs using a selective etch technology without Ex Situ surface passivation. IEEE Electron Device Lett 32(2):134–136CrossRef Kolluri S, Brown DF, Wong MH, Dasgupta S, Keller S, Denbaars SP, Mishra UK (2011) RF performance of deep-recessed N-polar GaN MIS-HEMTs using a selective etch technology without Ex Situ surface passivation. IEEE Electron Device Lett 32(2):134–136CrossRef
96.
go back to reference Wienecke S, Romanczyk B, Guidry M, Li H, Zheng X, Ahmadi E, Hestroffer K, Megalini L, Keller S, Mishra U (2016) N-polar deep recess MISHEMTs with record 2.9 W/mm at 94 GHz. IEEE Electron Device Lett 37(6):713–716. doi:10.1109/LED.2016.2556717 Wienecke S, Romanczyk B, Guidry M, Li H, Zheng X, Ahmadi E, Hestroffer K, Megalini L, Keller S, Mishra U (2016) N-polar deep recess MISHEMTs with record 2.9 W/mm at 94 GHz. IEEE Electron Device Lett 37(6):713–716. doi:10.​1109/​LED.​2016.​2556717
97.
go back to reference Guidry M, Wienecke S, Romanczyk B, Zheng X, Li H, Ahmadi E, Hestroffer K, Keller S, Mishra UK (2016) W-band passive load pull system for on-wafer characterization of high power density N-polar GaN devices based on output match and drive power requirements vs. gate width. In: 87th ARFTG Conference, San Fransisco, CA pp 1–4 Guidry M, Wienecke S, Romanczyk B, Zheng X, Li H, Ahmadi E, Hestroffer K, Keller S, Mishra UK (2016) W-band passive load pull system for on-wafer characterization of high power density N-polar GaN devices based on output match and drive power requirements vs. gate width. In: 87th ARFTG Conference, San Fransisco, CA pp 1–4
98.
go back to reference Guidry M, Wienecke S, Romanczyk B, Li H, Zheng X, Ahmadi E, Hestroffer K, Keller S, Mishra UK (2016) Small-signal model extraction of mm-wave N-polar GaN MISHEMT exhibiting record performance: analysis of gain and validation by 94 GHz loadpull. In: International microwave symposium 2016 (IMS2016), San Fransisco, CA, (accepted) Guidry M, Wienecke S, Romanczyk B, Li H, Zheng X, Ahmadi E, Hestroffer K, Keller S, Mishra UK (2016) Small-signal model extraction of mm-wave N-polar GaN MISHEMT exhibiting record performance: analysis of gain and validation by 94 GHz loadpull. In: International microwave symposium 2016 (IMS2016), San Fransisco, CA, (accepted)
103.
go back to reference Zhang N (2002) High voltage GaN HEMTs with low on-resistance for switching applications”, PhD dissertation. ECE Dept, Univ. of California, Santa Barbara Zhang N (2002) High voltage GaN HEMTs with low on-resistance for switching applications”, PhD dissertation. ECE Dept, Univ. of California, Santa Barbara
104.
go back to reference Quay R, Tessmann A, Kiefer R, Maroldt S, Haupt C, Nowotny U, Weber R, Massler H, Schwantuschke D, Seelmann-Eggebert M, Leuther A, Mikulla M, Ambacher O (2011) Dual-gate GaN MMICs for MM-wave operation. IEEE Microw Wirel Compon Lett 21(2):95–97CrossRef Quay R, Tessmann A, Kiefer R, Maroldt S, Haupt C, Nowotny U, Weber R, Massler H, Schwantuschke D, Seelmann-Eggebert M, Leuther A, Mikulla M, Ambacher O (2011) Dual-gate GaN MMICs for MM-wave operation. IEEE Microw Wirel Compon Lett 21(2):95–97CrossRef
105.
go back to reference van Heijningen M, Rodenburg M, van Vliet FE, Massler H, Tessmann A, Brueckner P, Mueller S, Schwantuschke D, Quay R, Narhi T, IEEE (2012) W-band power amplifier MMIC with 400 mW output power in 0.1 μm AlGaN/GaN technology. In: 2012 7th European microwave integrated circuits conference, pp 135–138 van Heijningen M, Rodenburg M, van Vliet FE, Massler H, Tessmann A, Brueckner P, Mueller S, Schwantuschke D, Quay R, Narhi T, IEEE (2012) W-band power amplifier MMIC with 400 mW output power in 0.1 μm AlGaN/GaN technology. In: 2012 7th European microwave integrated circuits conference, pp 135–138
106.
go back to reference Marti D, Tirelli S, Teppati V, Lugani L, Carlin JF, Malinverni M, Grandjean N, Bolognesi CR (2015) 94-GHz large-signal operation of AlInN/GaN high-electron-mobility transistors on silicon with regrown ohmic contacts. IEEE Electron Device Lett 36(1):17–19CrossRef Marti D, Tirelli S, Teppati V, Lugani L, Carlin JF, Malinverni M, Grandjean N, Bolognesi CR (2015) 94-GHz large-signal operation of AlInN/GaN high-electron-mobility transistors on silicon with regrown ohmic contacts. IEEE Electron Device Lett 36(1):17–19CrossRef
107.
go back to reference van Heijningen M, Rodenburg M, van Vliet FE, Massler H, Tessmann A, Brueckner P, Mueller S, Schwantuschke D, Quay R, Narhi T, IEEE (2012) W-band power amplifier MMIC with 400 mW output power in 0.1 μm AlGaN/GaN technology. In: 2012 7th European microwave integrated circuits conference, pp 135–138 van Heijningen M, Rodenburg M, van Vliet FE, Massler H, Tessmann A, Brueckner P, Mueller S, Schwantuschke D, Quay R, Narhi T, IEEE (2012) W-band power amplifier MMIC with 400 mW output power in 0.1 μm AlGaN/GaN technology. In: 2012 7th European microwave integrated circuits conference, pp 135–138
108.
go back to reference Makiyama K, Ozaki S, Okamoto N, Ohki T, Niida Y, Kamada Y, Joshin K, Watanabe K (2014) GaN-HEMT technology for high power millimeter-wave amplifier. In: Lester Eastman conference, pp 5–8 Makiyama K, Ozaki S, Okamoto N, Ohki T, Niida Y, Kamada Y, Joshin K, Watanabe K (2014) GaN-HEMT technology for high power millimeter-wave amplifier. In: Lester Eastman conference, pp 5–8
109.
go back to reference Masuda S, Ohki T, Makiyama K, Kanamura M, Okamoto N, Shigematsu H, Imanishi K, Kikkawa T, Joshin K, Hara N (2009) GaN MMIC amplifiers for W-band transceivers. In: Proceedings 39th European microwave conference EuMC, pp 1796–1799 Masuda S, Ohki T, Makiyama K, Kanamura M, Okamoto N, Shigematsu H, Imanishi K, Kikkawa T, Joshin K, Hara N (2009) GaN MMIC amplifiers for W-band transceivers. In: Proceedings 39th European microwave conference EuMC, pp 1796–1799
110.
go back to reference Joshin K, Makiyama K, Ozaki S, Ohki T, Okamoto N, Niida Y, Sato M, Masuda S, Watanabe K (2014) Millimeter-wave GaN HEMT for power amplifier applications. IEICE Trans Electron E97.C(10):923–929 Joshin K, Makiyama K, Ozaki S, Ohki T, Okamoto N, Niida Y, Sato M, Masuda S, Watanabe K (2014) Millimeter-wave GaN HEMT for power amplifier applications. IEICE Trans Electron E97.C(10):923–929
111.
go back to reference Makiyama K, Ohki T, Kanamura M, Joshin K, Imanishi K, Hara N, Kikkawa T (2009) High-power GaN-HEMT with high three-terminal breakdown voltage for W-band applications. Phys Status Solidi 6(S2):S1012–S1015CrossRef Makiyama K, Ohki T, Kanamura M, Joshin K, Imanishi K, Hara N, Kikkawa T (2009) High-power GaN-HEMT with high three-terminal breakdown voltage for W-band applications. Phys Status Solidi 6(S2):S1012–S1015CrossRef
112.
go back to reference Micovic M, Kurdoghlian A, Moyer HP, Hashimoto P, Hu M, Antcliffe M, Willadsen PJ, Wong WS, Bowen R, Milosavljevic I, Yoon Y, Schmitz A, Wetzel M, McGuire C, Hughes B, Chow DH (2008) GaN MMIC PAs for E-band (71 GHz–95 GHz) radio. In: 2008 IEEE compound semiconductor integrated circuits symposium, pp 1–4 Micovic M, Kurdoghlian A, Moyer HP, Hashimoto P, Hu M, Antcliffe M, Willadsen PJ, Wong WS, Bowen R, Milosavljevic I, Yoon Y, Schmitz A, Wetzel M, McGuire C, Hughes B, Chow DH (2008) GaN MMIC PAs for E-band (71 GHz–95 GHz) radio. In: 2008 IEEE compound semiconductor integrated circuits symposium, pp 1–4
113.
go back to reference Micovic M, Kurdoghlian A, Shinohara K, Burnham S, Milosavljevic I, Hu M, Corrion A, Fung A, Lin R, Samoska L, Kangaslahti P, Lambrigtsen B, Goldsmith P, Wong WS, Schmitz A, Hashimoto P, Willadsen PJ, Chow DH (2010) W-band GaN MMIC with 842 mW output power at 88 GHz. In: 2010 IEEE MTT-S international microwave symposium, pp 237–239 Micovic M, Kurdoghlian A, Shinohara K, Burnham S, Milosavljevic I, Hu M, Corrion A, Fung A, Lin R, Samoska L, Kangaslahti P, Lambrigtsen B, Goldsmith P, Wong WS, Schmitz A, Hashimoto P, Willadsen PJ, Chow DH (2010) W-band GaN MMIC with 842 mW output power at 88 GHz. In: 2010 IEEE MTT-S international microwave symposium, pp 237–239
114.
go back to reference Brown DF, Williams A, Shinohara K, Kurdoghlian A, Milosavljevic I, Hashimoto P, Grabar R, Burnham S, Butler C, Willadsen P, Micovic M (2011) W-band power performance of AlGaN/GaN DHFETs with regrown n + GaN ohmic contacts by MBE. In: 2011 international electron devices meeting, pp 19.3.1–19.3.4 Brown DF, Williams A, Shinohara K, Kurdoghlian A, Milosavljevic I, Hashimoto P, Grabar R, Burnham S, Butler C, Willadsen P, Micovic M (2011) W-band power performance of AlGaN/GaN DHFETs with regrown n + GaN ohmic contacts by MBE. In: 2011 international electron devices meeting, pp 19.3.1–19.3.4
115.
go back to reference Micovic M, Kurdoghlian A, Margomenos A, Brown DF, Shinohara K, Burnham S, Milosavljevic I, Bowen R, Williams AJ, Hashimoto P, Grabar R, C. Butler, A. Schmitz, P. J. Willadsen, and D. H. Chow, “92-96 GHz GaN power amplifiers,” in 2012 IEEE/MTT-S International Microwave Symposium Digest, 2012, pp. 1–3 Micovic M, Kurdoghlian A, Margomenos A, Brown DF, Shinohara K, Burnham S, Milosavljevic I, Bowen R, Williams AJ, Hashimoto P, Grabar R, C. Butler, A. Schmitz, P. J. Willadsen, and D. H. Chow, “92-96 GHz GaN power amplifiers,” in 2012 IEEE/MTT-S International Microwave Symposium Digest, 2012, pp. 1–3
116.
go back to reference Brown A, Brown K, Chen J, Hwang KC, Kolias N, Scott R (2011) W-band GaN power amplifier MMICs. In: 2011 IEEE MTT-S international microwave symposium, pp 1–4 Brown A, Brown K, Chen J, Hwang KC, Kolias N, Scott R (2011) W-band GaN power amplifier MMICs. In: 2011 IEEE MTT-S international microwave symposium, pp 1–4
117.
go back to reference Schellenberg J, Kim B, Phan T (2013) W-band, broadband 2 W GaN MMIC. In: 2013 IEEE MTT-S international microwave symposium digest (MTT), pp 1–4 Schellenberg J, Kim B, Phan T (2013) W-band, broadband 2 W GaN MMIC. In: 2013 IEEE MTT-S international microwave symposium digest (MTT), pp 1–4
118.
go back to reference Xu D, Chu KK, Diaz JA, Ashman M, Komiak JJ, Pleasant LM, Creamer C, Nichols K, Duh KHG, Smith PM, Chao PC, Dong L, Ye PD (2015) 0.1 μm atomic layer deposition Al2O3 passivated InAlN/GaN high electron-mobility transistors for E-band power amplifiers. IEEE Electron Device Lett 36(5):442–444CrossRef Xu D, Chu KK, Diaz JA, Ashman M, Komiak JJ, Pleasant LM, Creamer C, Nichols K, Duh KHG, Smith PM, Chao PC, Dong L, Ye PD (2015) 0.1 μm atomic layer deposition Al2O3 passivated InAlN/GaN high electron-mobility transistors for E-band power amplifiers. IEEE Electron Device Lett 36(5):442–444CrossRef
119.
go back to reference Lu J (2013) Design and epitaxial growth of ultra-scaled N-polar GaN/(In, Al, Ga) N HEMTs by metal organic chemical deposition and device characterization. PhD Dissertation, University of California, Santa Barbara Lu J (2013) Design and epitaxial growth of ultra-scaled N-polar GaN/(In, Al, Ga) N HEMTs by metal organic chemical deposition and device characterization. PhD Dissertation, University of California, Santa Barbara
Metadata
Title
Lateral GaN Devices for Power Applications (from kHz to GHz)
Authors
Umesh K. Mishra
Matthew Guidry
Copyright Year
2017
DOI
https://doi.org/10.1007/978-3-319-43199-4_4