Skip to main content
Disciplines
Automotive Business IT + Informatics Construction + Real Estate Electrical Engineering + Electronics Energy + Sustainability Insurance + Risk Finance + Banking Management + Leadership Marketing + Sales Mechanical Engineering + Materials
Events
DE
EN
Books
Journals
Topic Page
Marketing
Start single access now
Access for companies
EXTENDED SEARCH
Log in
Top
Journal of Electronic Materials
Published in: Journal of Electronic Materials 9/2018

26-02-2018 | Topical Collection: 17th Conference on Defects (DRIP XVII)

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry

Authors: Jean-Pierre Landesman, Daniel T. Cassidy, Marc Fouchier, Erwine Pargon, Christophe Levallois, Merwan Mokhtari, Juan Jimenez, Alfredo Torres

Published in: Journal of Electronic Materials | Issue 9/2018

Log in

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …
previous article Catastrophic Optical Damage of GaN-Based Diode Lasers: Sequence of Events, Damage Pattern, and Comparison with GaAs-Based Devices
next article Defect-Related Electroluminescence in the 1.2–1.7 μm Range from Boron-Implanted Silicon at Room Temperature

Dont have a licence yet? Then find out more about our products and how to get one now:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

inform now

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

inform now
Metadata
Title
Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry
Authors
Jean-Pierre Landesman
Daniel T. Cassidy
Marc Fouchier
Erwine Pargon
Christophe Levallois
Merwan Mokhtari
Juan Jimenez
Alfredo Torres
Publication date
26-02-2018
Publisher
Springer US
Published in
Journal of Electronic Materials / Issue 9/2018
Print ISSN: 0361-5235
Electronic ISSN: 1543-186X
DOI
https://doi.org/10.1007/s11664-018-6152-6

Other articles of this Issue 9/2018

Journal of Electronic Materials 9/2018 Go to the issue

Topical Collection: 17th Conference on Defects (DRIP XVII)

Photoconductivity of Macroporous and Nonporous Silicon with Ultrathin Oxide Layers

OriginalPaper

Efficiency Enhancement of CH3NH3SnI3 Solar Cells by Device Modeling

OriginalPaper

Dielectric, Hydrophobic Investigation of ABS/NiFe2O4 Nanocomposites Fabricated by Atomized Spray Assisted and Solution Casted Techniques for Miniaturized Electronic Applications

OriginalPaper

Statistical Analysis of Sputter Parameters on the Properties of ZnO Thin Films Deposited by RF Sputtering

Topical Collection: 17th Conference on Defects (DRIP XVII)

GaSb and GaSb/AlSb Superlattice Buffer Layers for High-Quality Photodiodes Grown on Commercial GaAs and Si Substrates

OriginalPaper

Influence of Annealing Ambient on the Photoelectric and Photoelectrochemical Properties of TiO2 Nanorod Arrays