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2017 | OriginalPaper | Chapter

Metal-Oxide Nanostructures Designed by Glancing Angle Deposition Technique and Its Applications on Sensors and Optoelectronic Devices: A Review

Author : Divya Singh

Published in: VLSI Design and Test

Publisher: Springer Singapore

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Abstract

Glancing angle deposited (GLAD) metal-oxide nanostructure films are promising materials for sensors and optoelectronic devices application due to the easy fabrication process, structural dependent properties and a large surface to volume ratio. This paper focuses on the literature reviews of metal-oxide nanostructures deposited by GLAD using all the possible deposition techniques such as thermal/electron-beam evaporation, sputtering magnetron, and pulsed laser deposition. The principle behind the formation of nanostructure through GLAD has also been discussed in details. The detailed analysis of the devices and their principle based on GLAD deposited metal-oxide nanostructures for different optoelectronic and sensor devices are also presented. This literature review will be helpful to understand and explore more on the growth of metal-oxide nanostructures using glancing angle deposition technique for futuristic sensors and optoelectronic device applications.

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Metadata
Title
Metal-Oxide Nanostructures Designed by Glancing Angle Deposition Technique and Its Applications on Sensors and Optoelectronic Devices: A Review
Author
Divya Singh
Copyright Year
2017
Publisher
Springer Singapore
Book
VLSI Design and Test

Print ISBN: 978-981-10-7469-1

Electronic ISBN: 978-981-10-7470-7

Copyright Year: 2017

DOI
https://doi.org/10.1007/978-981-10-7470-7_38