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1984 | OriginalPaper | Chapter

Monte Carlo Simulation of an Ion Sputtering Process of Polymer Materials

Authors : T. Takahagi, K. Okuno, S. Tomita, A. Ishitani

Published in: Secondary Ion Mass Spectrometry SIMS IV

Publisher: Springer Berlin Heidelberg

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Recently, the surface analysis of polymer materials has been becoming more and more important in industry. SIMS is expected to become a powerful tool for characterization of polymer surfaces. Several authors [1–5] have discussed the potential of SIMS in the field. However, understanding of sputtering mechanism of polymers is far from a satisfactory level. In this paper, we have examined sputtered surfaces with XPX and interpreted the observed spectra with a simple calculation based on Monte Carlo simulation.

Metadata
Title
Monte Carlo Simulation of an Ion Sputtering Process of Polymer Materials
Authors
T. Takahagi
K. Okuno
S. Tomita
A. Ishitani
Copyright Year
1984
Publisher
Springer Berlin Heidelberg
DOI
https://doi.org/10.1007/978-3-642-82256-8_100