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Published in: Metallurgical and Materials Transactions B 2/2014

01-04-2014

Oxidative Removal of Boron from Molten Silicon by CaO-based Flux Treatment with Oxygen Gas Injection

Authors: Mitsuru Tanahashi, Toshiharu Fujisawa, Chikabumi Yamauchi

Published in: Metallurgical and Materials Transactions B | Issue 2/2014

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Abstract

Oxidative removal of boron from molten silicon has been investigated at 1773 K (1500 °C) by CaO-based flux treatment with oxygen gas injection. Since oxygen gas is injected into the silicon melt after adding CaO- or CaCO3-CaF2 flux onto the melt, high oxygen partial pressure is maintained at the flux-O2-Si interface and the removal of boron proceeds under nonequilibrium conditions. The experimental results clarified that the behavior of boron removal from molten silicon depends on the competition between the oxidation reactions of boron and silicon. On the basis of the results obtained, optimum operating conditions for boron removal by the flux treatment were examined from the viewpoints of initial flux composition, reaction time, oxygen gas flow rate, and orifice size of gas injection nozzle. By repeating the batch operation for 120 seconds three times under the optimum conditions determined in the present study, boron concentration in metallurgical-grade silicon could be reduced from 14 to 7.6 mass ppm efficiently.

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Footnotes
1
The normalized partial pressure of component, i, p i, is defined as p i ≡ P i/\( P^{ \circ } \), where P i is the partial pressure of i (in Pa) and \( P^{ \circ } \) = 101,325 Pa.
 
2
Standard cubic centimeters per minute (SCCM) is defined as the standard unit (cm3 min−1) for the flow rate of gas whose temperature and pressure are, respectively, 298 K (25 °C) and 101,325 Pa.
 
3
Ban-ya[29] has clarified the correlation between the basicity of oxides and their ion-oxygen attraction. According to him, the basicities of oxide are higher in the order of CaO, AlO1.5 and SiO2. Compared these three oxides, CaO behaves as a basic oxide, while AlO1.5 and SiO2 behave as an acidic one.
 
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Metadata
Title
Oxidative Removal of Boron from Molten Silicon by CaO-based Flux Treatment with Oxygen Gas Injection
Authors
Mitsuru Tanahashi
Toshiharu Fujisawa
Chikabumi Yamauchi
Publication date
01-04-2014
Publisher
Springer US
Published in
Metallurgical and Materials Transactions B / Issue 2/2014
Print ISSN: 1073-5615
Electronic ISSN: 1543-1916
DOI
https://doi.org/10.1007/s11663-013-9966-x

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