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Published in: Journal of Materials Science: Materials in Electronics 21/2017

21-07-2017

P-type single-crystalline ZnO films obtained by (Li, N) dual implantation through dynamic annealing process

Authors: Zhiyuan Zhang, Jingyun Huang, Shanshan Chen, Xinhua Pan, Lingxiang Chen, Zhizhen Ye

Published in: Journal of Materials Science: Materials in Electronics | Issue 21/2017

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Abstract

Single-crystalline ZnO films were grown on c-plane sapphire substrates by plasma-assisted molecular beam epitaxy technique. The films have been implanted with fixed fluence of 30 keV Li and 80 keV N ions at 460 °C. It is shown that dually-implanted single crystalline ZnO films exhibit p-type characteristics with hole concentration in the range of 2.5 × 1015–2.3 × 1016 cm−3, hole mobilities between 0.8 and 1.04 cm2 V−1 s−1, and resistivities in the range of 328.9–2081 Ω cm by Hall-effect measurements. The ZnO film exhibit (0002) (c-plane) orientation with no secondary phase appearing after implantation as identified by the X-ray diffraction pattern. It is confirmed that Li and N ions were effectively implanted and successfully behave as acceptor measured by XPS and SIMS results. Also compared to other similar studies, lower amount of Li and N ions make p-type characteristics excellent. It is concluded that Li and N ion implantation and dynamic annealing play a critical role in forming p-type single-crystalline ZnO films.

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Metadata
Title
P-type single-crystalline ZnO films obtained by (Li, N) dual implantation through dynamic annealing process
Authors
Zhiyuan Zhang
Jingyun Huang
Shanshan Chen
Xinhua Pan
Lingxiang Chen
Zhizhen Ye
Publication date
21-07-2017
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 21/2017
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-017-7523-0

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