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1988 | OriginalPaper | Chapter

Structure and Hyperfine Interaction of Si3≡ Si• Defect Clusters

Authors : Michael Cook, C. T. White

Published in: The Physics and Technology of Amorphous SiO2

Publisher: Springer US

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The Pb center located at the Si(111)/SiO2 interface1,2 and the D-center in a-Si and a-Si:H3–5 each have g-tensors whose isotropic part g ~ 2.0055. A value of g = 2.0055 ± 0.0005 is considered to be diagnostic of radicals with the schematic structure Si3 ≡ Si•, in which the trivalent defect atom is bonded into the bulk material through three Si nearest neighbors. When the nearest neighbors are not all Si atoms (e.g., the E′ center in silica, O3≡ Si•) characteristically different ESR signatures are obtained. The similarity of the Pb and D-center g-factors suggests that the two defects might resemble each other closely not only in their schematic structures, but also in their detailed physical conformation and electronic structure.

Metadata
Title
Structure and Hyperfine Interaction of Si3≡ Si• Defect Clusters
Authors
Michael Cook
C. T. White
Copyright Year
1988
Publisher
Springer US
DOI
https://doi.org/10.1007/978-1-4613-1031-0_33

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