01-01-2012 | Technical Paper
Study of residual stress-induced deformation of multilayer cantilever for maskless microplasma etching
Published in: Microsystem Technologies | Issue 1/2012
Log inActivate our intelligent search to find suitable subject content or patents.
Select sections of text to find matching patents with Artificial Intelligence. powered by
Select sections of text to find additional relevant content using AI-assisted search. powered by