10. Summary of The Book

In DSAL, contacts (or vias) are indirectly formed through guide patterns (GPs). Thus, the integrity of GP is very important to obtain desirable contacts on a wafer. Since GP is created by traditional lithography, it may have some errors when its shape is large and complex (Shim and Shin, Proceedings of the International Conference on Very Large Scale Integration (VLSI-SoC) (2015), Shim, Chung and Shin, Proceedings of the International Conference on Computer Aided Design (2015)) [1, 2], which affect final contact patterns. Such limitation of GP shape calls for careful considerations in physical design. It has been also argued that conventional mask synthesis and verification for traditional lithography are obsolete in DSAL. In this context, this book has addressed problems on physical design and mask synthesis as follows.