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Journal of Materials Science

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01-10-2014

The key factor for fabricating through-hole TiO₂ nanotube arrays: a fluoride-rich layer between Ti substrate and nanotubes

Authors: Zhi-Yong Luo, Dong-Chuan Mo, Shu-Shen Lu

Published in: Journal of Materials Science | Issue 19/2014

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Abstract

Through-hole TiO₂ nanotube arrays (THTNA) are fabricated successfully by applying a large-voltage pulse (ΔV ≥ 40 V) at the end of anodization, and a mechanism is proposed that the fluoride-rich layer (FRL) between Ti substrate and nanotubes is the key factor for fabricating THTNA. In order to confirm the mechanism, the effects of temperature of voltage pulse on the morphology of the bottom of TiO₂ nanotubes are explored. The results show the inner diameter of the bottom became larger with the temperature increasing due to the wall thickness of bottom of TiO₂ nanotubes decreased and assisted by the increased fluorine content of the bottom, which is strong evidence for the mechanism proposed. What is more, the inner diameter of the bottom of THTNA can be manipulated via this novel mechanism.

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Title: The key factor for fabricating through-hole TiO2 nanotube arrays: a fluoride-rich layer between Ti substrate and nanotubes
Authors: Zhi-Yong Luo
Dong-Chuan Mo
Shu-Shen Lu
Publication date: 01-10-2014
Publisher: Springer US
Published in: Journal of Materials Science / Issue 19/2014
Print ISSN: 0022-2461
Electronic ISSN: 1573-4803
DOI: https://doi.org/10.1007/s10853-014-8368-z

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