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Journal of Coatings Technology and Research

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01-03-2011

Ti substituted nano-crystalline Cu₃N thin films

Authors: A. Rahmati, H. Bidadi, K. Ahmadi, F. Hadian

Published in: Journal of Coatings Technology and Research | Issue 2/2011

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Abstract

Ti:Cu₃N thin films were deposited on Si(111), quartz, and glass slide substrates by DC magnetron sputtering in molecular nitrogen ambient. The structural properties of Ti:Cu₃N thin films were studied by X-ray diffraction (XRD) analysis. XRD measurements show diffraction band with peaks close to the (100) and (200) diffraction lines of cubic anti-ReO₃ structure of Cu₃N. The Ti:Cu₃N nano-crystalline size is in the range 22–27 nm. Lattice constant expansion reflects Ti incorporation causing the excess nitrogen to occur. Surface morphology shows that the N richness suppresses the grain growth. The optical absorption spectra indicate a remarkable shift to higher energies of the absorption edge due to higher N concentration and quantum size effect. Photoluminescence (PL) measurement shows interstitial N excess and Ti impurity produce shallow and deep levels, respectively. Thermal stability of the Ti:Cu₃N films annealed at 300 and 400°C is improved in comparison with that of Ti free Cu₃N films.

previous article Syntheses of nano-multilayered TiN/TiSiN and CrN/CrSiN hard coatings

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Title: Ti substituted nano-crystalline Cu3N thin films
Authors: A. Rahmati
H. Bidadi
K. Ahmadi
F. Hadian
Publication date: 01-03-2011
Publisher: Springer US
Published in: Journal of Coatings Technology and Research / Issue 2/2011
Print ISSN: 1547-0091
Electronic ISSN: 1935-3804
DOI: https://doi.org/10.1007/s11998-010-9279-9

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