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Published in: Structural and Multidisciplinary Optimization 5/2011

01-11-2011 | Research Paper

Topology design with negative masks using gradient search

Author: Anupam Saxena

Published in: Structural and Multidisciplinary Optimization | Issue 5/2011

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Abstract

Previous implementations of the Material Mask Overlay Scheme (MMOS) (Saxena, ASME J Mech Des 130(8):1–9, 2009, 2010; Jain and Saxena, ASME J Mech Des 132(6):1–10, 2010) use stochastic search to achieve well connected, perfectly binary topologies but are computationally expensive. Here, a gradient search is employed to lay the negative masks over the design region. A continuous material assignment model is presented and studied. This investigation is motivated by the following goals: (a) reduction in the number of evaluations thereby making the search computationally efficient compared to the previous implementations, (b) obtaining as close to well-connected binary topologies as possible, and (c) influence of various parameters on the quality of solutions and existence of gray cells.

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Appendix
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Metadata
Title
Topology design with negative masks using gradient search
Author
Anupam Saxena
Publication date
01-11-2011
Publisher
Springer-Verlag
Published in
Structural and Multidisciplinary Optimization / Issue 5/2011
Print ISSN: 1615-147X
Electronic ISSN: 1615-1488
DOI
https://doi.org/10.1007/s00158-011-0649-4

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