Skip to main content
Top

2020 | OriginalPaper | Chapter

9. Yield Analysis and Quality Assurance and Control Methods Used in Microsystems Manufacturing

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

Abstract

This chapter covers the importance of ensuring quality and reviews methods for performing yield analysis in microsystems manufacturing. Methods for determining device functional and parametric yields are both reviewed. The types of defects that result in nonfunctional devices and various analytical techniques used for functional yield modeling based on point defects are explained. Parametric yield is then reviewed wherein a manufacturing function that incorporates all of the statistical distributions of the parameters describing the microsystems device’s output response is overlaid by an acceptance region to determine the yield. Methods to ensure quality during manufacturing using statistical process control (SPC) are covered. Control charts are used to show how processing steps can be monitored for whether they are in control or not. Process capability is shown to be an excellent gauge for whether a manufacturing process is able to produce devices having acceptable yields. Lastly, techniques for sampling of the measurements on wafers during and after manufacturing so as to obtain data that is rationally subgrouped so as to identify non-random changes are discussed.

Dont have a licence yet? Then find out more about our products and how to get one now:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Footnotes
1
This is a very simplistic example and assumes that indirect costs, such as marketing, sales, legal, management, etc., involved in the business operation are included in the die production cost. Additionally, there would also likely be a cost associated with the development of the manufacturing process for the microsystems that has not been included.
 
2
Most dies have regions where the presence of a defect may not impact the device operation. This can be especially true for MEMS devices.
 
3
Control charts can be used on the outcome of processing steps, groups of processing steps, or the entire process sequence.
 
4
This sentence implies that rational subgroups are only applied to processing steps. While it is true that rational subgroups are most often applied to processing steps, the concept can be used on process modules as well as process sequences.
 
Literature
2.
go back to reference G.S. May, C.J. Spanos, Fundamentals of Semiconductor Manufacturing and Process Control (Wiley, New Jersey, 2006)CrossRef G.S. May, C.J. Spanos, Fundamentals of Semiconductor Manufacturing and Process Control (Wiley, New Jersey, 2006)CrossRef
3.
go back to reference B. Murphy, Cost-size optima of monolithic integrated circuits. Proc. IEEE 52(12), 1537 (1964)CrossRef B. Murphy, Cost-size optima of monolithic integrated circuits. Proc. IEEE 52(12), 1537 (1964)CrossRef
4.
go back to reference J. Pineda de Gyvez, D. Pradhan, Integrated Circuit Manufacturability (IEEE Press, New York, 1999) J. Pineda de Gyvez, D. Pradhan, Integrated Circuit Manufacturability (IEEE Press, New York, 1999)
5.
go back to reference T. Okabe, M. Nagata, S. Shimada, Analysis of yield of integrated circuits and a new expression for the yield, in Defect and Fault Tolerance in VLSI Systems, ed. by C. Stapper, vol. 2, (Plenum Press, New York, 1990) T. Okabe, M. Nagata, S. Shimada, Analysis of yield of integrated circuits and a new expression for the yield, in Defect and Fault Tolerance in VLSI Systems, ed. by C. Stapper, vol. 2, (Plenum Press, New York, 1990)
6.
go back to reference C. Stapper, Fact and fiction in yield modeling. Microelectron. J. 210(1-2), 129 (1989)CrossRef C. Stapper, Fact and fiction in yield modeling. Microelectron. J. 210(1-2), 129 (1989)CrossRef
7.
go back to reference J. Cunningham, The use and evaluation of yield models in integrated circuit manufacturing. IEEE Trans. Semicond. Manuf. 3(2), 60 (1900)CrossRef J. Cunningham, The use and evaluation of yield models in integrated circuit manufacturing. IEEE Trans. Semicond. Manuf. 3(2), 60 (1900)CrossRef
8.
go back to reference C. Stapper, R. Rossner, A simplified method for modeling VLSI yields. Solid State Electron. 25(6), 655 (1973) C. Stapper, R. Rossner, A simplified method for modeling VLSI yields. Solid State Electron. 25(6), 655 (1973)
9.
go back to reference H.J. Larson, Introduction to Probability and Statistical Inference (Wiley, New York, 1969) H.J. Larson, Introduction to Probability and Statistical Inference (Wiley, New York, 1969)
10.
go back to reference T.R. Scott, T.P. Walker, Regionalization: A method for generating joint probability distributions. IEEE Trans. Circuits Sys CAS-23(4), 229 (1976)CrossRef T.R. Scott, T.P. Walker, Regionalization: A method for generating joint probability distributions. IEEE Trans. Circuits Sys CAS-23(4), 229 (1976)CrossRef
11.
go back to reference K.H. Lueng, R. Spruce, Efficient statistical circuit analysis. Electron. Lett. 10, 377 (1974)CrossRef K.H. Lueng, R. Spruce, Efficient statistical circuit analysis. Electron. Lett. 10, 377 (1974)CrossRef
12.
go back to reference S. Director, G.D. Hachtel, The simplicial approximation approach to design centering. IEEE Trans. Circuits Sys CAS-24(7), 363 (1977)MathSciNetCrossRef S. Director, G.D. Hachtel, The simplicial approximation approach to design centering. IEEE Trans. Circuits Sys CAS-24(7), 363 (1977)MathSciNetCrossRef
13.
go back to reference S. Director, G.D. Hachtel, L.M. Vidigal, Computationally efficient yield estimation procedures based on simplicial approximation. IEEE Trans. Circuits Sys CAS-25(3), 121 (1978)MathSciNetCrossRef S. Director, G.D. Hachtel, L.M. Vidigal, Computationally efficient yield estimation procedures based on simplicial approximation. IEEE Trans. Circuits Sys CAS-25(3), 121 (1978)MathSciNetCrossRef
14.
go back to reference D.C. Montgomery, Introduction to Statistical Process Control, 5th edn. (Wiley, New Jersey, 2005)MATH D.C. Montgomery, Introduction to Statistical Process Control, 5th edn. (Wiley, New Jersey, 2005)MATH
15.
go back to reference A. Duncan, Quality Control and Industrial Statistics (Irwin, Chicago, 1974)MATH A. Duncan, Quality Control and Industrial Statistics (Irwin, Chicago, 1974)MATH
16.
go back to reference Western Electric, Statistical Quality Control Handbook (Western Electric Corporation, Indianapolis, 1956) Western Electric, Statistical Quality Control Handbook (Western Electric Corporation, Indianapolis, 1956)
18.
go back to reference M. Pedersen, M. Huff, Plasma etching of deep high-aspect ratio features into fused silica. IEEE J. Microelectromech. Syst 28(2), 448 (2017)CrossRef M. Pedersen, M. Huff, Plasma etching of deep high-aspect ratio features into fused silica. IEEE J. Microelectromech. Syst 28(2), 448 (2017)CrossRef
Metadata
Title
Yield Analysis and Quality Assurance and Control Methods Used in Microsystems Manufacturing
Author
Michael Huff
Copyright Year
2020
DOI
https://doi.org/10.1007/978-3-030-40560-1_9