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2020 | OriginalPaper | Buchkapitel

9. Yield Analysis and Quality Assurance and Control Methods Used in Microsystems Manufacturing

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Abstract

This chapter covers the importance of ensuring quality and reviews methods for performing yield analysis in microsystems manufacturing. Methods for determining device functional and parametric yields are both reviewed. The types of defects that result in nonfunctional devices and various analytical techniques used for functional yield modeling based on point defects are explained. Parametric yield is then reviewed wherein a manufacturing function that incorporates all of the statistical distributions of the parameters describing the microsystems device’s output response is overlaid by an acceptance region to determine the yield. Methods to ensure quality during manufacturing using statistical process control (SPC) are covered. Control charts are used to show how processing steps can be monitored for whether they are in control or not. Process capability is shown to be an excellent gauge for whether a manufacturing process is able to produce devices having acceptable yields. Lastly, techniques for sampling of the measurements on wafers during and after manufacturing so as to obtain data that is rationally subgrouped so as to identify non-random changes are discussed.

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Fußnoten
1
This is a very simplistic example and assumes that indirect costs, such as marketing, sales, legal, management, etc., involved in the business operation are included in the die production cost. Additionally, there would also likely be a cost associated with the development of the manufacturing process for the microsystems that has not been included.
 
2
Most dies have regions where the presence of a defect may not impact the device operation. This can be especially true for MEMS devices.
 
3
Control charts can be used on the outcome of processing steps, groups of processing steps, or the entire process sequence.
 
4
This sentence implies that rational subgroups are only applied to processing steps. While it is true that rational subgroups are most often applied to processing steps, the concept can be used on process modules as well as process sequences.
 
Literatur
2.
Zurück zum Zitat G.S. May, C.J. Spanos, Fundamentals of Semiconductor Manufacturing and Process Control (Wiley, New Jersey, 2006)CrossRef G.S. May, C.J. Spanos, Fundamentals of Semiconductor Manufacturing and Process Control (Wiley, New Jersey, 2006)CrossRef
3.
Zurück zum Zitat B. Murphy, Cost-size optima of monolithic integrated circuits. Proc. IEEE 52(12), 1537 (1964)CrossRef B. Murphy, Cost-size optima of monolithic integrated circuits. Proc. IEEE 52(12), 1537 (1964)CrossRef
4.
Zurück zum Zitat J. Pineda de Gyvez, D. Pradhan, Integrated Circuit Manufacturability (IEEE Press, New York, 1999) J. Pineda de Gyvez, D. Pradhan, Integrated Circuit Manufacturability (IEEE Press, New York, 1999)
5.
Zurück zum Zitat T. Okabe, M. Nagata, S. Shimada, Analysis of yield of integrated circuits and a new expression for the yield, in Defect and Fault Tolerance in VLSI Systems, ed. by C. Stapper, vol. 2, (Plenum Press, New York, 1990) T. Okabe, M. Nagata, S. Shimada, Analysis of yield of integrated circuits and a new expression for the yield, in Defect and Fault Tolerance in VLSI Systems, ed. by C. Stapper, vol. 2, (Plenum Press, New York, 1990)
6.
Zurück zum Zitat C. Stapper, Fact and fiction in yield modeling. Microelectron. J. 210(1-2), 129 (1989)CrossRef C. Stapper, Fact and fiction in yield modeling. Microelectron. J. 210(1-2), 129 (1989)CrossRef
7.
Zurück zum Zitat J. Cunningham, The use and evaluation of yield models in integrated circuit manufacturing. IEEE Trans. Semicond. Manuf. 3(2), 60 (1900)CrossRef J. Cunningham, The use and evaluation of yield models in integrated circuit manufacturing. IEEE Trans. Semicond. Manuf. 3(2), 60 (1900)CrossRef
8.
Zurück zum Zitat C. Stapper, R. Rossner, A simplified method for modeling VLSI yields. Solid State Electron. 25(6), 655 (1973) C. Stapper, R. Rossner, A simplified method for modeling VLSI yields. Solid State Electron. 25(6), 655 (1973)
9.
Zurück zum Zitat H.J. Larson, Introduction to Probability and Statistical Inference (Wiley, New York, 1969) H.J. Larson, Introduction to Probability and Statistical Inference (Wiley, New York, 1969)
10.
Zurück zum Zitat T.R. Scott, T.P. Walker, Regionalization: A method for generating joint probability distributions. IEEE Trans. Circuits Sys CAS-23(4), 229 (1976)CrossRef T.R. Scott, T.P. Walker, Regionalization: A method for generating joint probability distributions. IEEE Trans. Circuits Sys CAS-23(4), 229 (1976)CrossRef
11.
Zurück zum Zitat K.H. Lueng, R. Spruce, Efficient statistical circuit analysis. Electron. Lett. 10, 377 (1974)CrossRef K.H. Lueng, R. Spruce, Efficient statistical circuit analysis. Electron. Lett. 10, 377 (1974)CrossRef
12.
Zurück zum Zitat S. Director, G.D. Hachtel, The simplicial approximation approach to design centering. IEEE Trans. Circuits Sys CAS-24(7), 363 (1977)MathSciNetCrossRef S. Director, G.D. Hachtel, The simplicial approximation approach to design centering. IEEE Trans. Circuits Sys CAS-24(7), 363 (1977)MathSciNetCrossRef
13.
Zurück zum Zitat S. Director, G.D. Hachtel, L.M. Vidigal, Computationally efficient yield estimation procedures based on simplicial approximation. IEEE Trans. Circuits Sys CAS-25(3), 121 (1978)MathSciNetCrossRef S. Director, G.D. Hachtel, L.M. Vidigal, Computationally efficient yield estimation procedures based on simplicial approximation. IEEE Trans. Circuits Sys CAS-25(3), 121 (1978)MathSciNetCrossRef
14.
Zurück zum Zitat D.C. Montgomery, Introduction to Statistical Process Control, 5th edn. (Wiley, New Jersey, 2005)MATH D.C. Montgomery, Introduction to Statistical Process Control, 5th edn. (Wiley, New Jersey, 2005)MATH
15.
Zurück zum Zitat A. Duncan, Quality Control and Industrial Statistics (Irwin, Chicago, 1974)MATH A. Duncan, Quality Control and Industrial Statistics (Irwin, Chicago, 1974)MATH
16.
Zurück zum Zitat Western Electric, Statistical Quality Control Handbook (Western Electric Corporation, Indianapolis, 1956) Western Electric, Statistical Quality Control Handbook (Western Electric Corporation, Indianapolis, 1956)
18.
Zurück zum Zitat M. Pedersen, M. Huff, Plasma etching of deep high-aspect ratio features into fused silica. IEEE J. Microelectromech. Syst 28(2), 448 (2017)CrossRef M. Pedersen, M. Huff, Plasma etching of deep high-aspect ratio features into fused silica. IEEE J. Microelectromech. Syst 28(2), 448 (2017)CrossRef
Metadaten
Titel
Yield Analysis and Quality Assurance and Control Methods Used in Microsystems Manufacturing
verfasst von
Michael Huff
Copyright-Jahr
2020
DOI
https://doi.org/10.1007/978-3-030-40560-1_9