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Microsystem Technologies
Published in: Microsystem Technologies 10-11/2014

01-10-2014 | Technical Paper

Advanced mask aligner lithography (AMALITH) for thick photoresist

Authors: Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Marc Hennemeyer, Ralph Zoberbier, Anja Voigt, Gabi Grützner, Nezih Ünal, Ulrich Hofmann

Published in: Microsystem Technologies | Issue 10-11/2014

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Abstract

Advanced mask aligner lithography (AMALITH) is a holistic approach to improve shadow printing (contact and proximity lithography) in mask aligners. AMALITH is based on two tools, the MO Exposure Optics®, a new illumination system allow shaping the angular spectrum of the illumination light, and LAB, a software tool for full 3D simulation of the shadow printing process. MO Exposure Optics® is provided by SUSS MicroTec AG (http://​www.​suss.​com), as an upgrade for all current and older mask aligner models. MO Exposure Optics® decouples the illumination from lamp misplacement (self-calibrated light source), improves the light uniformity, provides telecentric illumination and enables customized illumination in mask aligners. LAB is a software tool provided by GenISys GmbH (http://​www.​genisys-gmbh.​com), and allows simulating the complete chain from illumination, mask pattern, photoresist and resist processing. The combination of both tools allows optimizing mask aligner lithography beyond today’s limits.
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Literature
Motzek K, Bich A, Erdmann A, Hornung M, Hennemeyer M, Meliorisz B, Hofmann U, Unal N, Voelkel R, Partel S, Hudek P (2010) Optimization of illumination pupils and mask structures for proximity printing. Microelectronic Engineering, Vol 87, 5–8. The 35th International Conference on Micro- and Nano-Engineering (MNE), May–August 2010, pp 1164–1167, ISSN 0167-9317
Rogoff R, Davies G, Mulkens J, de Klerk J, van Oorschot P, Kalmbach G, Wangler J, Rupp W (1996) Photolithography using the AERIAL™ illuminator in a variable NA wafer stepper. SPIE Symposium on Microlithography, Santa Clara, March 10–15
Voelkel R (2012) Wafer-scale micro-optics fabrication. Adv Opt Technol (AOT) 1:135–150
Voelkel R, Vogler U, Bich A, Weible KJ, Eisner M, Hornung M, Kaiser P, Zoberbier R, Cullmann E (2009) Illumination system for a microlithographic contact and proximity exposure apparatus. Eur Pat Appl EP 2253997:A2
Voelkel R, Vogler U, Bich A, Pernet P, Weible KJ, Hornung M, Zoberbier R, Cullmann E, Stuerzebecher L, Harzendorf T, Zeitner UD (2010) Advanced mask aligner lithography: new illumination system. Opt Express 18:20968–20978CrossRef
Voelkel R, Vogler U, Bramati A, Weichelt T, Stuerzebecher L, Zeitner UD, Motzek K, Erdmann A, Hornung M, Zoberbier R (2012) Advanced mask aligner lithography. Proc. SPIE 8326, Optical Microlithography XXV, 83261Y
Metadata
Title
Advanced mask aligner lithography (AMALITH) for thick photoresist
Authors
Reinhard Voelkel
Uwe Vogler
Arianna Bramati
Marc Hennemeyer
Ralph Zoberbier
Anja Voigt
Gabi Grützner
Nezih Ünal
Ulrich Hofmann
Publication date
01-10-2014
Publisher
Springer Berlin Heidelberg
Published in
Microsystem Technologies / Issue 10-11/2014
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-013-1950-5

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