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Journal of Computational Electronics

Published in:

01-03-2014

Challenges and opportunities for process modeling in the nanotechnology era

Authors: J. K. Lorenz, E. Baer, A. Burenkov, A. Erdmann, P. Evanschitzky, P. Pichler

Published in: Journal of Computational Electronics | Issue 1/2014

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Abstract

Process modeling is a very diverse area with respect of the processes and materials to be treated as well as concerning the methods to be used. In this paper an outline of the scope of process modeling and simulation is given. Challenges and opportunities are discussed referring especially to the challenges identified in the Modeling and Simulation chapter of the International Technology Roadmap for Semiconductors. Some related results of Fraunhofer IISB are presented. Overall, TCAD including process modeling and simulation is an indispensable tool for the further development of semiconductor technologies and devices, and offers large opportunities to support and partly enable future scaling in More Moore, but also the further improvement of More than Moore devices and systems.

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Title: Challenges and opportunities for process modeling in the nanotechnology era
Authors: J. K. Lorenz
E. Baer
A. Burenkov
A. Erdmann
P. Evanschitzky
P. Pichler
Publication date: 01-03-2014
Publisher: Springer US
Published in: Journal of Computational Electronics / Issue 1/2014
Print ISSN: 1569-8025
Electronic ISSN: 1572-8137
DOI: https://doi.org/10.1007/s10825-013-0477-4

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