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Friction
Metadata
Title
Chemical mechanical polishing: Theory and experiment
Authors
Dewen Zhao
Xinchun Lu
Publication date
01-12-2013
Publisher
Tsinghua University Press
Published in
Friction / Issue 4/2013
Print ISSN: 2223-7690
Electronic ISSN: 2223-7704
DOI
https://doi.org/10.1007/s40544-013-0035-x

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Friction 4/2013 Go to the issue

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Towards a unified classification of wear

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Scratch formation and its mechanism in chemical mechanical planarization (CMP)

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Y2O3 nanosheets as slurry abrasives for chemical-mechanical planarization of copper

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Abrasive-free polishing of hard disk substrate with H2O2-C4H10O2-Na2S2O5 slurry

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Hydrophobic, mechanical, and tribological properties of fluorine incorporated hydrogenated fullerene-like carbon films

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