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Published in: Journal of Materials Science: Materials in Electronics 23/2017

19-08-2017

Comparative study of multilayered ZnO/TiO2/ZnO and TiO2/ZnO/TiO2 thin films prepared by sol–gel dip coating method

Authors: M. I. Khan, Muhammad Saleem, K. A. Bhatti, Rabia Qindeel, Hayat Saeed Althobaiti, Noorah Alonizan

Published in: Journal of Materials Science: Materials in Electronics | Issue 23/2017

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Abstract

The aim of this research work is to represent the comparative study of ZnO/TiO2/ZnO (ZTZ) and TiO2/ZnO/TiO2 (TZT) thin films deposited by sol–gel dip coating on FTO substrates. After deposition, the films were annealed at 500 °C for 1 h. Structural, surface morphology, optical and electrical properties of these films were studied by X-ray diffractrometer (XRD), Raman spectra, atomic force microscope (AFM), photoluminescence spectra (PL) and four point probe technique respectively. XRD and Raman spectra confirmed the anatase, brookite phases of TiO2 and cubic phase of ZnO. AFM confirmed the formation of nano particles with average sizes of 18.4 and 47.2 nm of TZT and ZTZ films respectively. According to PL spectra, both the multilayer films slowdown the electron hole recombination rate and enhances the optoelectronic properties of the materials. Also it showed the peaks in the visible region of spectrum. The four point probe results showed that the average sheet resistivity of the films is 450 and 120 (ohm-m) respectively.

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Metadata
Title
Comparative study of multilayered ZnO/TiO2/ZnO and TiO2/ZnO/TiO2 thin films prepared by sol–gel dip coating method
Authors
M. I. Khan
Muhammad Saleem
K. A. Bhatti
Rabia Qindeel
Hayat Saeed Althobaiti
Noorah Alonizan
Publication date
19-08-2017
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 23/2017
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-017-7685-9

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