Skip to main content
Top
Published in: Journal of Materials Science: Materials in Electronics 21/2017

06-07-2017

Comprehensive characterization of PVDF-TrFE thin films for microelectromechanical system applications

Authors: Alperen Toprak, Onur Tigli

Published in: Journal of Materials Science: Materials in Electronics | Issue 21/2017

Log in

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

Abstract

This paper presents a comprehensive characterization of a polyvinylidene fluoride-trifluoroethylene (PVDF-TrFE) thin film with 75/25 molar ratio for piezoelectric MEMS applications. PVDF-TrFE film was deposited on a silicon substrate using spin coating, and electrodes were formed using sputtering. Dielectric constant and dielectric loss factor were measured at different frequencies. Frequency and temperature dependence of the ferroelectric response was examined to investigate required poling conditions and maximum operating temperature. The lower limit for the coercive field was measured as 55 V/μm at room temperature. Coercive field decreased with temperature with a slope of −0.1 V/μm K, and ferroelectric to paraelectric transition occurred between 100  and 108 °C. Piezoelectric displacement measurements were performed using an atomic force microscope based method. Average value of the effective piezoelectric d33 coefficient was measured as −23.9 pm/V. No degradation was observed in this value after 2 × 105 unipolar excitation cycles. On the other hand, significant fatigue was observed in the piezoelectric response due to polarization switching; 1.8 × 105 cycles caused an average reduction of 33% in the effective d33. Presented data corroborates with the previous studies in the literature and can be used in the design of PVDF-TrFE based MEMS devices utilizing its dielectric, ferroelectric, and piezoelectric properties.

Dont have a licence yet? Then find out more about our products and how to get one now:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Springer Professional "Wirtschaft"

Online-Abonnement

Mit Springer Professional "Wirtschaft" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 340 Zeitschriften

aus folgenden Fachgebieten:

  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Versicherung + Risiko




Jetzt Wissensvorsprung sichern!

Literature
1.
go back to reference P. Muralt, IEEE Trans. Ultrason. Ferroelectr. FrEq. Control 47(4), 903–915 (2000)CrossRef P. Muralt, IEEE Trans. Ultrason. Ferroelectr. FrEq. Control 47(4), 903–915 (2000)CrossRef
2.
3.
4.
go back to reference P. Muralt, R. G. Polcawich, S. Trolier-McKinstry, MRS Bull. 34(09), 658–664 (2009)CrossRef P. Muralt, R. G. Polcawich, S. Trolier-McKinstry, MRS Bull. 34(09), 658–664 (2009)CrossRef
5.
go back to reference Y.B. Jeon, R. Sood, J.H. Jeong and S.G. Kim, Sens. Actuators A Phys. 122(1), 16–22 (2005)CrossRef Y.B. Jeon, R. Sood, J.H. Jeong and S.G. Kim, Sens. Actuators A Phys. 122(1), 16–22 (2005)CrossRef
6.
go back to reference B. Lee, S. Lin, W. Wu, X. Wang, P. Chang, C. Lee, J. Micromec. Microeng. 19(6), 065014 (2009)CrossRef B. Lee, S. Lin, W. Wu, X. Wang, P. Chang, C. Lee, J. Micromec. Microeng. 19(6), 065014 (2009)CrossRef
7.
go back to reference N. Setter, D. Damjanovic, L. Eng, G. Fox, S. Gevorgian, S. Hong, A. Kingon, H. Kohlstedt, N.Y. Park, G.B. Stephenson, I. Stolitchnov, A.K. Taganstev, D.V. Taylor, T. Yamada, S. Streiffer, J. Appl. Phys. 100(5), 051606 (2006)CrossRef N. Setter, D. Damjanovic, L. Eng, G. Fox, S. Gevorgian, S. Hong, A. Kingon, H. Kohlstedt, N.Y. Park, G.B. Stephenson, I. Stolitchnov, A.K. Taganstev, D.V. Taylor, T. Yamada, S. Streiffer, J. Appl. Phys. 100(5), 051606 (2006)CrossRef
8.
go back to reference I.Y. Shen, G.Z. Cao, C.C. Wu, C.C. Lee, Ferroelectrics 342(1), 15–34 (2006)CrossRef I.Y. Shen, G.Z. Cao, C.C. Wu, C.C. Lee, Ferroelectrics 342(1), 15–34 (2006)CrossRef
9.
10.
11.
12.
go back to reference T. Nakajima, K. Okaya, K. Ohta, T. Furukawa, S. Okamura, Jpn. J. Appl. Phys. 50(9), 09ND14 (2011)CrossRef T. Nakajima, K. Okaya, K. Ohta, T. Furukawa, S. Okamura, Jpn. J. Appl. Phys. 50(9), 09ND14 (2011)CrossRef
13.
go back to reference A. Toprak, O. Tigli, Tech. Proc. NSTI Nanotech. Conf. Expo. 2, 69–72 (2014) A. Toprak, O. Tigli, Tech. Proc. NSTI Nanotech. Conf. Expo. 2, 69–72 (2014)
14.
go back to reference R. Simoes, M. Rodriguez-Perez, J. De Saja, L. Marques, A. Kinoshita, C. Constantino, in 11th International Conference on Advanced Materials, Rio de Janerio, (2009) R. Simoes, M. Rodriguez-Perez, J. De Saja, L. Marques, A. Kinoshita, C. Constantino, in 11th International Conference on Advanced Materials, Rio de Janerio, (2009)
15.
17.
go back to reference T. Furukawa, T. Nakajima, Y. Takahashi, IEEE Trans. Dielectr. Electr. Insul. 13(5), 1120–1131 (2006) T. Furukawa, T. Nakajima, Y. Takahashi, IEEE Trans. Dielectr. Electr. Insul. 13(5), 1120–1131 (2006)
18.
go back to reference D. Mao, B. E. Gnade, M. A. Quevedo-Lopez, in Ferroelectrics, ed. by M. Lallart (InTech, Rijeka, 2011), p. 77 D. Mao, B. E. Gnade, M. A. Quevedo-Lopez, in Ferroelectrics, ed. by M. Lallart (InTech, Rijeka, 2011), p. 77
19.
go back to reference F. Xia, H. Xu, F. Fang, B. Razavi, Z.-Y. Cheng, Y. Lu, B. Xu, Q.M. Zhang, Appl. Phys. Lett. 78(8), 1122–1124 (2001)CrossRef F. Xia, H. Xu, F. Fang, B. Razavi, Z.-Y. Cheng, Y. Lu, B. Xu, Q.M. Zhang, Appl. Phys. Lett. 78(8), 1122–1124 (2001)CrossRef
20.
go back to reference S.-M. Yoon, S.-W. Jung, S. Yang, S.-H.K. Park, B.-G. Yu, H. Ishiwara, Curr. Appl. Phys. 11(3), S219–S224 (2011)CrossRef S.-M. Yoon, S.-W. Jung, S. Yang, S.-H.K. Park, B.-G. Yu, H. Ishiwara, Curr. Appl. Phys. 11(3), S219–S224 (2011)CrossRef
21.
22.
go back to reference D. Mao, I. Mejia, H. Stiegler, B. Gnade, M. Quevedo-Lopez, Org. Electron 12(8), 1298–1303 (2011)CrossRef D. Mao, I. Mejia, H. Stiegler, B. Gnade, M. Quevedo-Lopez, Org. Electron 12(8), 1298–1303 (2011)CrossRef
23.
go back to reference D. Mao, I. Mejia, H. Stiegler, B.E. Gnade, M.A. Quevedo-Lopez, J. Appl. Phys 108(9), 094102 (2010)CrossRef D. Mao, I. Mejia, H. Stiegler, B.E. Gnade, M.A. Quevedo-Lopez, J. Appl. Phys 108(9), 094102 (2010)CrossRef
24.
go back to reference N. Takashi, A. Ryosuke, T. Yoshiyuki, F. Takeo, Jpn. J. Appl. Phys. 44(10L), L1385 (2005) N. Takashi, A. Ryosuke, T. Yoshiyuki, F. Takeo, Jpn. J. Appl. Phys. 44(10L), L1385 (2005)
25.
go back to reference X. Zhang, X. Du, Y. Hou, Z. Lü, H. Xu, Appl. Phys. Lett. 104(10), 103505 (2014)CrossRef X. Zhang, X. Du, Y. Hou, Z. Lü, H. Xu, Appl. Phys. Lett. 104(10), 103505 (2014)CrossRef
26.
go back to reference X.L. Zhang, H.S. Xu, Y.N. Zhang, J. Phys. D Appl. Phys. 44(15), 155501 (2011)CrossRef X.L. Zhang, H.S. Xu, Y.N. Zhang, J. Phys. D Appl. Phys. 44(15), 155501 (2011)CrossRef
27.
28.
go back to reference H. Wang, Q.M. Zhang, L.E. Cross, A.O. Sykes, J. Appl. Phys. 74(5), 3394–3398 (1993)CrossRef H. Wang, Q.M. Zhang, L.E. Cross, A.O. Sykes, J. Appl. Phys. 74(5), 3394–3398 (1993)CrossRef
29.
30.
go back to reference W.J. Hu, D.M. Juo, L. You, J. Wang, Y.C. Chen, Y.H. Chu, T. Wu, Sci. Rep. 4, 4772 (2014)CrossRef W.J. Hu, D.M. Juo, L. You, J. Wang, Y.C. Chen, Y.H. Chu, T. Wu, Sci. Rep. 4, 4772 (2014)CrossRef
31.
go back to reference L. M. Blinov, M. F. Vladimir, P. P. Sergei, A. V. Bune, P. A. Dowben, D. Stephen, Physics-Uspekhi 43(3), 243 (2000)CrossRef L. M. Blinov, M. F. Vladimir, P. P. Sergei, A. V. Bune, P. A. Dowben, D. Stephen, Physics-Uspekhi 43(3), 243 (2000)CrossRef
32.
33.
go back to reference D. Zhao, I. Katsouras, M. Li, K. Asadi, J. Tsurumi, G. Glasser, J. Takeya, P.W. Blom, D.M. de Leeuw, Sci. Rep. 4, 5075 (2014)CrossRef D. Zhao, I. Katsouras, M. Li, K. Asadi, J. Tsurumi, G. Glasser, J. Takeya, P.W. Blom, D.M. de Leeuw, Sci. Rep. 4, 5075 (2014)CrossRef
Metadata
Title
Comprehensive characterization of PVDF-TrFE thin films for microelectromechanical system applications
Authors
Alperen Toprak
Onur Tigli
Publication date
06-07-2017
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 21/2017
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-017-7482-5

Other articles of this Issue 21/2017

Journal of Materials Science: Materials in Electronics 21/2017 Go to the issue