Skip to main content
Disciplines
Automotive Business IT + Informatics Construction + Real Estate Electrical Engineering + Electronics Energy + Sustainability Insurance + Risk Finance + Banking Management + Leadership Marketing + Sales Mechanical Engineering + Materials
Events
DE
EN
Books
Journals
Topic Page
Marketing
Start single access now
Access for companies
EXTENDED SEARCH
Log in
Top
Published in:
Fundamentals of Sputtering Read chapter Read first chapter

1984 | OriginalPaper | Chapter

Depth Profiling of Heat-Treated Mo Films on SiO2/Si Substrates

Authors : K. Fujinaga, I. Kawashima

Published in: Secondary Ion Mass Spectrometry SIMS IV

Publisher: Springer Berlin Heidelberg

Included in: Professional Book Archive

Get Access

Activate our intelligent search to find suitable subject content or patents.

search-config
loading …

An Mo film deposited on an SiO2 surface is composed of columnar grains. Heat treatment causes grain growth and results in an increase in surface roughness [1] . As a result, Mo film sputtering features are different from pre-annealed Mo films.

previous chapter Depth Profiling of Evaporated Se-Te Films with SIMS
next chapter SIMS Depth Profiling of Shallow As Implants in Si and SiO2
Metadata
Title
Depth Profiling of Heat-Treated Mo Films on SiO2/Si Substrates
Authors
K. Fujinaga
I. Kawashima
Copyright Year
1984
Publisher
Springer Berlin Heidelberg
Book
Secondary Ion Mass Spectrometry SIMS IV

Print ISBN: 978-3-642-82258-2

Electronic ISBN: 978-3-642-82256-8

Copyright Year: 1984

DOI
https://doi.org/10.1007/978-3-642-82256-8_86