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Published in: Journal of Materials Science: Materials in Electronics 6/2020

12-02-2020

MBE growth of InAs/GaAs quantum dots on sintered porous silicon substrates with high optical quality in the 1.3 μm band

Authors: Mansour Aouassa, Giorgia Franzò, Elie Assaf, Larbi Sfaxi, Ridha M’Ghaieth, Hassen Maaref

Published in: Journal of Materials Science: Materials in Electronics | Issue 6/2020

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Abstract

We report self-assembled InAs/GaAs quantum dots (QDs) monolithically grown on a compliant transferable silicon nanomembrane. The transferable silicon nanomembrane with flat continuous crystalline silicon layer formed via in situ porous silicon sintering is considered a low-cost seed for heteroepitaxy of free-standing single-crystalline foils for photovoltaic cells. In this paper, the compliant feature of transferable silicon nanomembrane has been exploited for direct growth of high-quality InAs/GaAs (QDs) by molecular beam epitaxy. Bright 1.3 µm room temperature photoluminescence from InAs/GaAs QDs has been obtained. The excellent structural and optical qualities of the obtained InAs/GaAs quantum dots offer great opportunities for realizing a low-cost and large-scale integration of III–V-based optoelectronic device on silicon.

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Metadata
Title
MBE growth of InAs/GaAs quantum dots on sintered porous silicon substrates with high optical quality in the 1.3 μm band
Authors
Mansour Aouassa
Giorgia Franzò
Elie Assaf
Larbi Sfaxi
Ridha M’Ghaieth
Hassen Maaref
Publication date
12-02-2020
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 6/2020
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-020-03012-7

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