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Published in: Journal of Materials Science: Materials in Electronics 21/2018

05-09-2018 | Review

Mechanism of grain growth and excellent polarization, dielectric relaxtion of La3+, Nd3+ modified PZT nano-films prepared by sol–gel technique

Authors: Liu Yang, De-Yi Zheng, Kai-Xin Guo, Wan-Nan Zhao, Ze-Hui Peng, Gui-Gui Peng, Tao Zhou

Published in: Journal of Materials Science: Materials in Electronics | Issue 21/2018

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Abstract

Ferroelectric PbZr0.52Ti0.48O3 film and its partial substitutions by rare earth ions La3+ and Nd3+ Pb0.9(La/Nd)0.1Zr0.52Ti0.48O3, grown on Pt(111)/Ti/SiO2/Si(100) substrates, were prepared via sol–gel and rapid thermal processes. Structural characterization by X-ray diffraction and scanning electron microscopy showed that Pb(Zr0.52Ti0.48)O3 and Pb0.9La0.1(Zr0.52Ti0.48)O3 films are of (111) preferred orientation but Pb0.9Nd0.1(Zr0.52Ti0.48)O3 is more inclined to (100) reflection though both are of tetragonal perovskite structure. The results indicate that the piezoelectric properties of PZT thin films can be improved by doping La3+ and Nd3+ substituted A-site. The d33 can be dramatically improved by doping La3+. Moreover, Pr of Pb(Zr0.52Ti0.48)O3 films reaches up to 120.53 µC/cm2, while the doping samples present relatively inferior ferroelectric hysteresis loops (PrLa = 64.32, PrNd = 53.17 µC/cm2), greater dielectric constants, higher dielectric loss and lower leakage current than the undoped Pb(Zr0.52Ti0.48)O3 sample. And meanwhile, the samples showed a typical non-Debye dielectric spectroscopy of multiple quantum relaxation time distribution observing from the Cole–Cole plot at room temperature.

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Metadata
Title
Mechanism of grain growth and excellent polarization, dielectric relaxtion of La3+, Nd3+ modified PZT nano-films prepared by sol–gel technique
Authors
Liu Yang
De-Yi Zheng
Kai-Xin Guo
Wan-Nan Zhao
Ze-Hui Peng
Gui-Gui Peng
Tao Zhou
Publication date
05-09-2018
Publisher
Springer US
Published in
Journal of Materials Science: Materials in Electronics / Issue 21/2018
Print ISSN: 0957-4522
Electronic ISSN: 1573-482X
DOI
https://doi.org/10.1007/s10854-018-9974-3

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