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Published in: Microsystem Technologies 2/2021

21-08-2018 | Technical Paper

Role of dielectric layer and beam membrane in improving the performance of capacitive RF MEMS switches for Ka-band applications

Authors: K. Girija Sravani, T. Lakshmi Narayana, Koushik Guha, K. Srinivasa Rao

Published in: Microsystem Technologies | Issue 2/2021

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Abstract

In this paper, we have analyzed the role of dielectric layer and different beam membranes on the performance parameters of shunt capacitive RF MEMS switch. The investigation mainly focused on the major challenges of performance parameters are reducing actuating voltage and improving the isolation. The actuation voltage is reduced by incorporation of non-uniform meanders to the serpentine membrane structure and also improved the isolation using 50 nm AlN dielectric thin film. Here, we have incorporated the holes to the top membrane which help the switch to improve the insertion property. The actuation voltage required to move the switch downwards is 5.4 V and the switch operates at transition time of 12 μs. The isolation − 72.4 dB is observed at the frequency of 27 GHz and insertion − 0.34 dB is observed at the frequency of 27 GHz. The characteristics of switch have been observed by simulating the switch design in FEM tool and results have been compared with theoretical calculations. Finally, the switch is optimized based on the switch performance parameters and it is suitable for Ka-band applications.

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Metadata
Title
Role of dielectric layer and beam membrane in improving the performance of capacitive RF MEMS switches for Ka-band applications
Authors
K. Girija Sravani
T. Lakshmi Narayana
Koushik Guha
K. Srinivasa Rao
Publication date
21-08-2018
Publisher
Springer Berlin Heidelberg
Published in
Microsystem Technologies / Issue 2/2021
Print ISSN: 0946-7076
Electronic ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-018-4038-4

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