Techniques of Interference Reduction in Probe System for Wafer Level Noise Measurements of Submicron Semiconductor Devices

A probe system for wafer level noise measurements of submicron structures has been briefly presented. Significant influences on probe measurement have interference and inherent noise of the system, especially high level interference introduced by probes (contact resistance probe to wafer area fluctuations caused by vibrations and mechanical shocks in the measurement environment) and electromagnetic (EM) surroundings. Periodical interference caused by vibrations and EM fields can be separated from measured noise. The waveforms are recorded as a sequence of time series with duration being the multiple of the interference period and coherently summed up and finally subtracted from the registered data. It enables to analyse random and periodical components of the signal separately.