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Published in:
Fundamentals of Sputtering Read chapter Read first chapter

1984 | OriginalPaper | Chapter

The Effects of Ion Beam Sputtering on the Chemical State of Metal Oxide Surfaces

Authors : K. Hara, T. Itoh

Published in: Secondary Ion Mass Spectrometry SIMS IV

Publisher: Springer Berlin Heidelberg

Included in: Professional Book Archive

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For the studies of the surface properties of solids and the measurement of the depth profile of an element, ion beam sputtering has been used generally in combination with various methods for surface analysis, e.g. secondary ion mass spectrometry(SIMS). However, it has not been investigated experimentally about the interrelations of the sputtering and the changes of surface states.[1]

previous chapter Low Energy Oxygen Ion Implantation and Ion-Bombardment Induced Oxidation of Silicon, Studied by SIMS, AES, and XPS
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Metadata
Title
The Effects of Ion Beam Sputtering on the Chemical State of Metal Oxide Surfaces
Authors
K. Hara
T. Itoh
Copyright Year
1984
Publisher
Springer Berlin Heidelberg
Book
Secondary Ion Mass Spectrometry SIMS IV

Print ISBN: 978-3-642-82258-2

Electronic ISBN: 978-3-642-82256-8

Copyright Year: 1984

DOI
https://doi.org/10.1007/978-3-642-82256-8_67