TiO_x/Ag/TiO_x multilayer for application as a transparent conductive electrode and heat mirror

Amorphous TiO_x films and Ag layer were deposited by electron-beam evaporation on soda-lime glass at room temperature. The details regarding the structure, surface morphology, and optical properties of the as-prepared TiO_x films were examined by X-ray diffraction, scanning electron microscopy, and ultra-violet (UV) -visible-near-infrared (NIR) spectrometry. The TiO_x films exhibit amorphous phase with an optical band gap of 3.35 eV. The polygrains oriented along the (111) and (200) directions in the Ag films were adopted to supply carriers into the TiO_x film and lower the sheet resistance of the stacked layer. The multilayer exhibited a sufficiently large Ag thickness (>15 nm), low resistance, high UV transmittance, visible transmittance, and high NIR reflection. Dependence of Ag thickness, TiO_x bottom-layer, and TiO_x overlayer on the optical and electrical properties of TiO_x/Ag/TiO_x were explored. A figure of merit (FOM) was used to find an optimal structure for a multilayer with superior conductivity and visible transparency. An FOM of 9.8 × 10⁻² (Ω⁻¹) at the visible wavelength of 550 nm for a TiO_x/Ag/TiO_x stacked layer with an 18-nm-thick Ag and a 20-nm-thick TiO_x was achieved. The TiO_x/Ag/TiO_x sample annealed at 500 °C 10 min also shows a good thermal stability.